Tabletop vacuum bake/HMDS deposition equipment 58TA-58TA

Tabletop vacuum bake/HMDS deposition equipment 58TA
HiSOL,Inc.

HiSOL,Inc.'s Response Status

Response Rate

100.0%

Response Time

40.5hours

About This Product

This equipment is specialized for vapor deposition (vapor priming) of HMDS (hexamethyldisilazane), and various parameters of the equipment are preset specifically for HMDS. Highly reliable film formation is possible with simple operation using a touch panel. It is a high-cost performance system that is compact and suitable for R&D and small-volume production, regardless of the installation location.

There are various processing methods for HMDS coating, such as spray coating and spin coating, but the vapor deposition method, in which the wafer is exposed to HMDS vapor to form a film, has the advantages of a large contact angle and long durability after processing, and It has a great advantage in that it can significantly reduce the amount of solvent used and reduce costs.

■Application・Form a SAM film (self-assembled monolayer) and modify the surface to make it hydrophobic
・Improved adhesion between substrate and resist (resist coating pretreatment)
・Chemical bond between organic and inorganic substances
・MEMS stiction (friction due to sticking) prevention coating etc…

■Equipment features・High temperature stability within the wafer surface during processing (temperature is monitored at the back and both sides of the chamber)
・High in-plane contact angle uniformity after treatment
・The steam prime method can dramatically reduce the amount of solvent used compared to the spin coating method, and the contact angle on the wafer surface after film formation lasts for a long time (lasts for more than 2 weeks).
・All processes are processed in the chamber at once, extremely high safety
・The wafer surface is completely dehydrated by the vacuum → N2 purge process performed before the vapor deposition process, forming a highly uniform and stable film.
・It is possible to process three-dimensional structures such as MEMS without any problems.
・Wafers can be stored in an optional cassette and multiple wafers can be processed simultaneously.
・Supports image reversal

■TA series processThis equipment first performs a pre-bake (150℃) before the vapor deposition process, and then repeats a vacuum/N2 purge cycle. Through this process, moisture on the workpiece is completely dehydrated, and HMDS and the substrate are in stable contact with each other. (dehydration)

In addition, the vacuum/N2 purge cycle is performed again after the HMDS process is completed, leaving no HMDS residue or ammonia gas generated by chemical reactions in the chamber, allowing the operator to remove the workpiece in a safe environment. .

Model
There are 1 models for this product.

Product
Tabletop vacuum bake/HMDS deposition equipment 58TA

Handling Company
HiSOL,Inc.

Categories

Machining / Machine Tools

Vacuum Vapor Deposition Devices

Machining / Machine Tools

Deposition Equipment

100+ people viewing

Last viewed: 15 hours ago

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1 Models of Tabletop vacuum bake/HMDS deposition equipment 58TA

Image	Part Number	Price (excluding tax)	Power (50/60Hz)	Weight (approx.)	Applicable clean room	Setting resolution	Temperature stability	Body dimensions (approx.) W×D×H	Compatible wafer size	Operating temperature	Supply gas connection	Number of recipes	Process time	Chamber dimensions (approx.) W×D×H	Throughput	Cleanliness	Capacity	Image reversal	N2 gas consumption
	58TA	Available upon quote	Single phase 208 – 230V, 20A	132kg	Class 10	1 second	±5℃	74×63×88cm	~300 mm (12″)	Room temperature –180℃	・Compressed air or N2: For valve control ・N2: For chamber vent ・Ammonia: For image reversal	8 recipes	0–999,999 seconds	40.5×46×40.5cm	2 batches/hour (image reversal: 1 batch/hour)	<5 × 1um particles / 150mm wafer	4″ wafer 12 cassettes 5″ wafer 8 cassettes 6″ wafer 2 cassettes 8″ wafer 2 cassettes 12″ wafer 2 cassettes	Correspondence	16 SCF/process

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About Company Handling This Product

HiSOL,Inc.

Response Rate

100.0%

Response Time

40.5hrs

Company Overview

Hisol Inc., established in 1967 as Kan Electronics, is a manufacturer based in Tokyo, Japan, producing machine...

Japan

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Tabletop vacuum bake/HMDS deposition equipment 58TA HiSOL,Inc.

HiSOL,Inc.'s Response Status

About This Product

■Application

■Equipment features

■TA series process

1 Models of Tabletop vacuum bake/HMDS deposition equipment 58TA

58TA

Customers who viewed this product also viewed

Other products of HiSOL,Inc.

About Company Handling This Product

Related search keywords

Tabletop vacuum bake/HMDS deposition equipment 58TA
HiSOL,Inc.