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Plasma stripper descum equipment CV200RFSHandling Company
HiSOL,Inc.Image | Part Number | Price (excluding tax) | Power supply | Weight | Setting resolution | Temperature stability | Body size (approx.) W×D×H | Operating temperature | Cooling method | Number of recipes | Mass flow controller | Hot plate area | Process gas flow rate | Process gas | Plasma irradiation time | Chamber size (approx.) W×D×H | Throughput | Strip rate | Cleanliness | Capacity | RF plasma | N2 flow rate |
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CV200RFS |
Available upon quote |
Single phase 200 – 250V, 20A, 50/60Hz |
147kg |
1 second |
< 10% |
61×109×114 cm |
Room temperature –250℃ |
Forced air cooling |
12 recipes |
Options Up to 4 pieces |
Up to 200mm wafer |
20–50 SCCM |
4 types |
0–1,200 seconds |
25×29×5 cm |
1 wafer/min |
Up to 7,000Å/min |
Class 10 |
Single 50–200mm wafer |
40kHz, 100 – 1,000W |
Up to 1.7 SCFM |
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