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Vacuum lamp annealing equipment (RTP/RTA) AccuThermo AW820V-AW820V
Vacuum lamp annealing equipment (RTP/RTA) AccuThermo AW820V-HiSOL,Inc.

Vacuum lamp annealing equipment (RTP/RTA) AccuThermo AW820V
HiSOL,Inc.

HiSOL,Inc.'s Response Status

Response Rate

100.0%

Response Time

40.5hours


About This Product

The AccuThermo series high-speed heat treatment equipment is an infrared lamp annealing equipment (RTP/RTA system) that heats wafers at a maximum temperature of 1250℃ and a heating rate of 100℃/sec using powerful visible to infrared light irradiation. AccuThermo AW820V is a vacuum RTP/RTA capable of annealing up to 8-inch wafers, 16 x 2-inch wafers, 5 x 3-inch wafers, and 4 x 4-inch wafers in vacuum or in any process gas atmosphere. It's a system. This is a high performance and highly reliable lamp annealing system that can be used for research and development and prototyping as well as small lot production.

■Application

・Activation treatment after ion implantation ・Ohmic contact formation ・Annealing of compound semiconductors such as GaAs, GaN, InP, SiC, etc. ・Crystallization annealing of ferroelectric thin films such as PZT and SBT ・PV cell annealing ・Oxide film formation ・Silicide formation, salicide formation ・Poly silicon annealing treatment

■Features

- Compatible with vacuum processes (achieved vacuum level 0.01Pa *when using turbo molecular pump) ・Supports vacuum level adjustment control using throttle valve control. ・Supports high-speed heat treatment with a maximum temperature of 1250℃ and a maximum heating rate of 150℃/sec. *When processing standard Si wafers ・Improved heat uniformity (within Δ10℃) by lamp zone output control (10 zones) ・Clean heat treatment with non-contact heating and cold wall structure. ・Process gas flow rate control using MFC (programmable, up to 5 systems of MFC can be incorporated) ・Temperature control algorithm optimized for RTA process. ・Recipe editing/saving, real-time process monitoring, and process data management using a built-in PC. - Supports various calibrations including pyrometer calibration on software. - Thorough safety measures such as watchdog timer, excessive temperature rise prevention, cooling water circulation flow monitoring, etc.

  • Product

    Vacuum lamp annealing equipment (RTP/RTA) AccuThermo AW820V

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1 Models of Vacuum lamp annealing equipment (RTP/RTA) AccuThermo AW820V

Image Part Number Price (excluding tax) In-plane temperature uniformity Cooling rate Sample loading method Vacuum adjustment range (optional) Number of registered recipes Temperature measurement accuracy Temperature control range Temperature control method Heating rate Compatible board size Safety measures External dimensions/weight Heating method Heating direction Ultimate vacuum Cooling method Number of steps per recipe Number of lamp zones Process control method Processing room, sample loading section Number of process gas lines Process gas type Process gas flow control range Chamber cooling method Type Main features of the software
Vacuum lamp annealing equipment (RTP/RTA) AccuThermo AW820V-Part Number-AW820V

AW820V

Available upon quote

ΔT 10℃

10℃/sec~100℃/sec

Front loading (manual)

6.7Pa~1733Pa, atmospheric pressure

No limit

±1℃ (after calibration)

100℃~1,250℃

Closed-loop control with sensed temperature feedback

10℃/sec~100℃/sec

[Standard] φ5 inch ~ φ8 inch
[Option] φ2 inch ~ φ4 inch
[Option] 200mm × 200mm square board
[Option] When using susceptor: Individual chips ~φ8 inch

Emergency stop switch, excessive temperature detection, cooling water monitoring, door opening/closing monitoring, watchdog timer, etc.

W978×D1,220×H1,780 mm・460kg

Infrared lamp radiant heating (1.5kW x 27, Top 13, Bottom 14)

2 directions, top and bottom

0.01Pa

Forced air cooling with gas purge

Up to 40 steps
(In case of cyclic annealing, up to 99 loops are supported)

10 zone independent control

Equipment embedded computer board, RTAPro software, 17-inch touch screen, keyboard, mouse

Aluminum chamber with quartz windows on top and bottom, quartz tray

[Standard] 1 system (N2)
[Option] Up to 5 lines

N2, O2, He, Ar, forming gas (hydrogen concentration approximately 5%)

[Standard] 0.2slpm~10slpm (controlled by MFC)
[Option] 20sccm~1000sccm (controlled by MFC) etc.

Combined air cooling and water cooling

8 inch compatible

・Real-time process monitor
・Recipe editing, saving, reading
・Process data recall
・Process data output (Txt format)
・Various calibrations
・System diagnosis etc.

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About Company Handling This Product

Response Rate

100.0%


Response Time

40.5hrs

Company Overview

Hisol Inc., established in 1967 as Kan Electronics, is a manufacturer based in Tokyo, Japan, producing machine...

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