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Atmospheric pressure lamp annealing equipment (RTP/RTA) AccuThermo AW610M-AW610M
Atmospheric pressure lamp annealing equipment (RTP/RTA) AccuThermo AW610M-HiSOL,Inc.

Atmospheric pressure lamp annealing equipment (RTP/RTA) AccuThermo AW610M
HiSOL,Inc.

HiSOL,Inc.'s Response Status

Response Rate

100.0%

Response Time

40.5hours


About This Product

■Domestic sales record: 50 units or more Best-selling RTA system ideal for research and development

The AccuThermo series high-speed heat treatment equipment is an infrared lamp annealing equipment (RTP/RTA system) that heats wafers using powerful visible to infrared light irradiation at a maximum temperature of 1250℃ and a heating rate of 150℃/sec. AccuThermo AW610M is an atmospheric pressure RTP/RTA system that can handle up to 6-inch wafers, 4 x 2-inch wafers, 3 x 3-inch wafers, and 156 mm square PV cells, and is suitable for research, development, and prototyping purposes. This is a high performance and highly reliable lamp annealing system that can also be used for small lot production.

■Application

・Activation treatment after ion implantation ・Ohmic contact formation ・Annealing of compound semiconductors such as GaAs, GaN, InP, SiC, etc. ・Crystallization annealing of ferroelectric thin films such as PZT and SBT ・PV cell annealing ・Oxide film formation ・Silicide formation, salicide formation ・Poly silicon annealing treatment

■Features

- Compact desktop system saves space. ・Supports high-speed heat treatment with a maximum temperature of 1250℃ and a maximum heating rate of 150℃/sec. *When processing standard Si wafers ・Improved heat uniformity (within Δ10℃) by lamp zone output control (6 zones) ・Clean heat treatment using non-contact heating, insulated quartz tube, and cold wall structure. ・Suitable for heat treatment with residual oxygen concentration of 10ppm or less using purge replacement method. ・Patented ERP pyrometer (450℃ ~ 1250℃) *Optional ・Process gas flow rate control using MFC (programmable, up to 4 MFC systems can be incorporated) ・Temperature control algorithm optimized for RTA process. -Quartz tube and quartz tray can be removed and replaced with simple operation. (Easy to clean deposit items) ・Recipe editing/saving, real-time process monitoring, and process data management using a built-in PC. - Supports various calibrations including pyrometer calibration on software. - Thorough safety measures such as watchdog timer, excessive temperature rise prevention, cooling water circulation flow monitoring, etc.

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    Atmospheric pressure lamp annealing equipment (RTP/RTA) AccuThermo AW610M

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1 Models of Atmospheric pressure lamp annealing equipment (RTP/RTA) AccuThermo AW610M

Image Part Number Price (excluding tax) In-plane temperature uniformity Cooling rate Sample loading method Number of registered recipes Temperature measurement accuracy Temperature control range TC Temperature control range (Option) Pyrometer Temperature control range (Option) Special-TC Temperature control method Heating rate Compatible board size Safety measures External dimensions/weight Heating method Heating direction Cooling method Number of steps per recipe Number of lamp zones Process control method Processing room, sample loading section Number of process gas lines Process gas type Process gas flow control range Chamber material Chamber cooling method Type Main features of the software
Atmospheric pressure lamp annealing equipment (RTP/RTA) AccuThermo AW610M-Part Number-AW610M

AW610M

Available upon quote

ΔT 10℃

10℃/sec~150℃/sec

Front loading (manual)

No limit

TC: ±1℃ (after calibration), ERP pyrometer: ±4℃ (after calibration)

100℃~800℃

450℃~1,250℃

100℃~1,050℃

Closed-loop control with sensed temperature feedback

10℃/sec~150℃/sec

[Standard] φ3 inch ~ φ6 inch
[Option] φ2 inch ~ φ4 inch
[Option] 156mm x 156mm square board
[Option] When using susceptor: Individual chips ~ φ6 inch

Emergency stop switch, excessive temperature detection, cooling water monitoring, door opening/closing monitoring, watchdog timer, etc.

W660×D432×H366 mm・50kg

Infrared lamp radiant heating (1.2kW x 21, Top 10, Bottom 11)

2 directions, top and bottom

Forced air cooling with gas purge

Up to 40 steps
(In case of cyclic annealing, up to 99 loops are supported)

6 zone independent control

Equipment embedded computer board, RTAPro software, 17-inch LCD monitor, keyboard, mouse

Quartz tube, quartz tray

[Standard] 1 system (N2)
[Option] Up to 4 lines

N2, O2, He, Ar, forming gas (hydrogen concentration approximately 5%)

[Standard] 0.2slpm~10slpm (controlled by MFC)
[Option] 20sccm~1000sccm (controlled by MFC) etc.

Aluminum alloy + diffuse reflective Au coating

Combined air cooling and water cooling

6 inch compatible

・Real-time process monitor
・Recipe editing, saving, reading
・Process data recall
・Process data output (Txt format)
・Various calibrations
・System diagnosis etc.

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About Company Handling This Product

Response Rate

100.0%


Response Time

40.5hrs

Company Overview

Hisol Inc., established in 1967 as Kan Electronics, is a manufacturer based in Tokyo, Japan, producing machine...

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