Plasma emission real monitor EMICON MC series-MC series

Plasma emission real monitor EMICON MC series
FORU LIMITED.

About This Product

Applications for EMICON
■TroubleshootingYou can monitor the change in the specified wavelength peak over time and understand the process status. If you record the light emitting state during normal processes, you can quickly determine the cause of the abnormality by comparing it with the light emitting state where the abnormality occurred.

■Process developmentIncreasing the gas flow rate and power increases the emission intensity. Also, if multiple gases are injected at the same time, the emission intensity will change compared to injecting each gas individually, even if the power and flow conditions are the same. Therefore, a luminescence intensity monitor can be used as a reference meter when conditions change.

■Reactive sputter deposition control・1.4nm high resolution spectrometer
・200-1,100nm wide area monitor
・Control using noise component removal wavelength
- Easily switch to a different type of target process in seconds by simply changing the recipe.

Model
There is 1 model available for this product.

Product
Plasma emission real monitor EMICON MC series

Handling Company
FORU LIMITED.

120+ people viewing

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1 Models of Plasma emission real monitor EMICON MC series

Image	Part Number	Price (excluding tax)	Power supply	Wavelength range (nm)	Resolution (nm)	Signal resolution	Digital in/out	Number of channels	Analog in/out	PC connection
	MC series	Available upon quote	AC 100V	200 - 1,100	1.4FWHM	16 Bit	4/4 BNC	1-8	8BNC	USB 2.0

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About Company Handling This Product

FORU LIMITED.

Japan

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Plasma emission real monitor EMICON MC series FORU LIMITED.

About This Product

■Troubleshooting

■Process development

■Reactive sputter deposition control

1 Models of Plasma emission real monitor EMICON MC series

MC series

Other products of FORU LIMITED.

About Company Handling This Product

Plasma emission real monitor EMICON MC series
FORU LIMITED.