ICP plasma source COPRA
XQ Instruments

About This Product

This is an ICP type plasma source manufactured by CCR in Germany. Almost all equipment manufacturers in Europe use it as their plasma source for PVD assist or PECVD.

■Features・Many deliveries of large plasma sources over 1m using CCR's unique technology
・Can be adjusted to various vacuum levels for evaporation, sputtering, and PECVD using CCR's unique technology
・Because it is an ICP method, the risk of chamber contamination is low and the maintenance load is low.
・Because it is an ICP method, there is little change in ion energy due to input power, and there is little damage to the board.

■Oxidation and nitridation assist during sputteringEffect: Reactive coating at a deposition rate comparable to metal mode

■PECVD in sputter vacuum areaEffect: PECVD can be incorporated into sputtering equipment

■Etching before PVD film formationEffect: Improved adhesion

■Ar assist during PVD film formationEffect: Increased density of deposited layer

Model
There is 1 model available for this product.

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ICP plasma source COPRA

Handling Company
XQ Instruments

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1 Models of ICP plasma source COPRA

Image	Part Number	Price (excluding tax)
	COPRA	Available upon quote

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About Company Handling This Product

XQ Instruments

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XQ Instruments develops and manufactures innovative, patented equipment for semi-automated processes. Focus is...

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ICP plasma source COPRA XQ Instruments

About This Product

■Features

■Oxidation and nitridation assist during sputtering

■PECVD in sputter vacuum area

■Etching before PVD film formation

■Ar assist during PVD film formation

1 Models of ICP plasma source COPRA

COPRA

Other products of XQ Instruments

About Company Handling This Product

ICP plasma source COPRA
XQ Instruments