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ICP plasma source COPRA-COPRA
ICP plasma source COPRA-XQ Instruments

ICP plasma source COPRA
XQ Instruments


About This Product

This is an ICP type plasma source manufactured by CCR in Germany. Almost all equipment manufacturers in Europe use it as their plasma source for PVD assist or PECVD.

■Features

・Many deliveries of large plasma sources over 1m using CCR's unique technology ・Can be adjusted to various vacuum levels for evaporation, sputtering, and PECVD using CCR's unique technology ・Because it is an ICP method, the risk of chamber contamination is low and the maintenance load is low. ・Because it is an ICP method, there is little change in ion energy due to input power, and there is little damage to the board.

■Oxidation and nitridation assist during sputtering

Effect: Reactive coating at a deposition rate comparable to metal mode

■PECVD in sputter vacuum area

Effect: PECVD can be incorporated into sputtering equipment

■Etching before PVD film formation

Effect: Improved adhesion

■Ar assist during PVD film formation

Effect: Increased density of deposited layer

  • Product

    ICP plasma source COPRA

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1 Models of ICP plasma source COPRA

Image Part Number Price (excluding tax)
ICP plasma source COPRA-Part Number-COPRA

COPRA

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XQ Instruments develops and manufactures innovative, patented equipment for semi-automated processes. Focus is...

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