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  2. Swing cathode for stationary facing sputtering (XQ Instruments)
Swing cathode for stationary facing sputtering-SMS
Swing cathode for stationary facing sputtering-XQ Instruments

Swing cathode for stationary facing sputtering
XQ Instruments

About This Product

Conventional rotary cathodes can only be used if the substrate moves. For this reason, a rotary cathode cannot be used with stationary facing batch type sputtering equipment. This swing cathode has an internal magnetic bar that swings from side to side like a swinging fan. By arranging multiple swing cathodes, we can achieve both a distribution of ±2% or less for stationary substrates, which was previously impossible, and a target usage efficiency of over 70%, which is the biggest advantage of rotary cathodes. I will. In addition, when depositing a film on a three-dimensional object, by oscillating the magnet, it is possible to promote the material to wrap around areas that would otherwise be in the shadows, thereby improving distribution. Furthermore, by reversing the magnet, it is possible to clean the target before actual production without consuming the dummy board. The internal magnetic bar swings from side to side like a swinging fan. By arranging multiple cathodes, we simultaneously achieve a distribution of less than ±1% on a stationary board and a usage efficiency of more than 70%, which is the advantage of rotary cathodes.

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    Swing cathode for stationary facing sputtering

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3 Models of Swing cathode for stationary facing sputtering

Click on the part number for more information about each product

Image Part Number Price (excluding tax) Horizontal/vertical mounting Longest loadable target Current that can be applied Possible voltage Maximum input power Dedicated motor and belt Compatible target length
Swing cathode for stationary facing sputtering-Part Number-SMS

SMS

Available upon quote

Both possible

4,000 mm

450A

1,500V

200kW at DC/ 80kHz at MFAC

Include

Up to 4,000mm

Swing cathode for stationary facing sputtering-Part Number-MMS

MMS

Available upon quote

Both possible

2,500mm

225A

1,500V

200kW at DC/ 80kHz at MFAC

Include

Up to 4,000mm

Swing cathode for stationary facing sputtering-Part Number-CMS

CMS

Available upon quote

Both possible

1,000mm

50A

1,500V

200kW at DC/ 80kHz at MFAC

Include

Up to 4,000mm

Click on the part number for more information about each product

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About Company Handling This Product

XQ Instruments

Company Overview

XQ Instruments develops and manufactures innovative, patented equipment for semi-automated processes. Focus is...

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