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  3. Nanoimprint Machines
  4. Nanoimprint Model TM-04 (Mitsui Electric Seiki Co., Ltd.)
Nanoimprint Model TM-04-TM-04
Nanoimprint Model TM-04-Mitsui Electric Seiki Co., Ltd.

Nanoimprint Model TM-04
Mitsui Electric Seiki Co., Ltd.

Mitsui Electric Seiki Co., Ltd.'s Response Status

Response Rate

100.0%

Response Time

80.6hours

About This Product

■Nanoimprint

Nanoimprinting is attracting attention as a technology that presses extremely finely machined molds of several tens to hundreds of nanometers onto resin or glass to produce large quantities of parts with the same shape in a short period of time. The method is broadly divided into the thermosetting method, which softens with heat and then cools and hardens, and the photocuring method, which uses UV curing resin and hardens it with UV light.

■Model TM-04

To date, experiments have been conducted on nanoimprint devices in various places, and research is being carried out every day toward practical application. Our company has manufactured various imprint devices so far, but we have never manufactured a simple imprint device. Therefore, we have created an unprecedented nanoimprinting device based on the concept of a ``portable and simple imprinting device'' that can be used anywhere without a power source. The device is equipped with an LED type UV lamp and uses a motor drive for lifting and lowering, making it easy to adjust the lifting and lowering speed. The press load for transfer can be applied at a maximum of 200N, and the maximum substrate size can be Φ20. First of all, this is a recommended machine for those who want to create imprint samples at a low cost using a simple testing machine.

  • Product

    Nanoimprint Model TM-04

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1 Models of Nanoimprint Model TM-04

Image Part Number Price (excluding tax) Power supply Sample size Equipment dimensions Press load Press peeling speed Sample board Imprint method UV equipment performance
Nanoimprint Model TM-04-Part Number-TM-04

TM-04

Available upon quote

AC100V or
DC12V 2.3A small battery

10mm×10mm

H469×W300×D200 (mm)

1~20N

20mm/sec

Si wafer/glass substrate

Light curing method

Light intensity 6.0mW/cm2
Wavelength max. 370mm

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About Company Handling This Product

Mitsui Electric Seiki Co., Ltd.

Response Rate

100.0%

Response Time

80.6hrs

  • Japan

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Nanoimprint Machines　Mitsui Electric Seiki Co., Ltd.
Mitsui Electric Seiki Co., Ltd.

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