Vacuum deposition equipment for lift-off, thick film, and low-temperature film formation SEC-22C-SEC-22C

Vacuum deposition equipment for lift-off, thick film, and low-temperature film formation SEC-22C
Sanko Ematech Co., Ltd.

Sanko Ematech Co., Ltd.'s Response Status

Response Rate

100.0%

Response Time

42.2hours

Company Review

5.0

About This Product

■Product descriptionAn electron beam type evaporation source is used as the evaporation source, and it is possible to form films of high melting point metals and oxides. Evaporation rate and film thickness are controlled using a crystal oscillation type film thickness meter. The main pump is equipped with a cryopump. The operation control system is fully automatic.

■FeaturesThe evaporation source and substrate jig are arranged to obtain good film thickness distribution. The electron beam evaporation source uses a 6-point crucible, so it is possible to form 6 types of films in the same vacuum. It can store 30 boards with a diameter of 75 mm, 20 boards with a diameter of 100 mm, and 9 boards with a diameter of 150 mm. Film formation is possible within an incident angle of ±5°. The anti-fouling shield inside the vacuum chamber is separated, so it can be easily replaced.

A board cleaning mechanism and speed trap are available as options.

■Main uses・Electrode film/protective film
・Lift-off film formation
・Thick film deposition
・Low temperature film formation

Model
There are 1 models for this product.

Product
Vacuum deposition equipment for lift-off, thick film, and low-temperature film formation SEC-22C

Handling Company
Sanko Ematech Co., Ltd.

Categories

Machining / Machine Tools

Vacuum Vapor Deposition Devices

150+ people viewing

Last viewed: 8 hours ago

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1 Models of Vacuum deposition equipment for lift-off, thick film, and low-temperature film formation SEC-22C

Image	Part Number	Price (excluding tax)	Electric power evaporation source	Power main unit	Evaporation source	Film thickness distribution	Vacuum chamber size	Water amount	Pumping speed	Exhaust system	Substrate heating	Compressed air	Arrival pressure	Manufacturer	Footprint	Gas pressure
	SEC-22C	Available upon quote	Φ3 200V Approx. 25KVA (73A)	Φ3 200V Approx. 40KVA (115A)	Electron gun 270° deflection, power 16kW	Within ±1% (within batch, between batches) T/S=900mm	W800mm×D800mm×H1,300mm, made of SUS304	0.2MPa or more (differential pressure), 44L/min, 20~25℃	From atmospheric pressure to 4.0×10-4Pa within 20 minutes	Cryopump, dry pump, mechanical booster pump	MAX150℃ Regular use 100℃	0.7MPa (set pressure 0.5MPa), connection diameter Rc1/2	6.7×10-5Pa or less	Showa Vacuum Co., Ltd.	W3,700mm×D4,300mm×H2,400mm	0.05MPa (set pressure 0.02MPa), connection diameter SWL1/4

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About Company Handling This Product

Sanko Ematech Co., Ltd.

Response Rate

100.0%

Response Time

42.2hrs

Company Review

5.0

Japan

Vacuum deposition equipment for lift-off, thick film, and low-temperature film formation SEC-22C Sanko Ematech Co., Ltd.

Sanko Ematech Co., Ltd.'s Response Status

About This Product

■Product description

■Features

■Main uses

1 Models of Vacuum deposition equipment for lift-off, thick film, and low-temperature film formation SEC-22C

SEC-22C

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Other products of Sanko Ematech Co., Ltd.

About Company Handling This Product

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Vacuum deposition equipment for lift-off, thick film, and low-temperature film formation SEC-22C
Sanko Ematech Co., Ltd.