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  2. 5nm nanomachining photomask repair system RAVE nm-VI (Bruker Corporation)
5nm nanomachining photomask repair system RAVE nm-VI-RAVE nm-VI
5nm nanomachining photomask repair system RAVE nm-VI-Bruker Corporation

5nm nanomachining photomask repair system RAVE nm-VI
Bruker Corporation

Bruker Corporation's Response Status

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100.0%

Response Time

30.7hours

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About This Product

■High-precision nanomachining repair equipment

・High-precision modification of photomasks for cutting-edge semiconductor devices after the 7nm node ・Digital control further improves correction accuracy ・By digitalizing the control of the NanoBit™ probe, we have achieved Edge Placement≦2nm and Z control≦1nm. Next-generation photomasks such as halftone, Levenson, and quartz (CPL) can also be modified with high precision. ・Using the most advanced HAR NanoBit™, defects in fine patterns and high aspect patterns can be repaired with high precision. ・By adding the BitClean option function, it is possible to easily remove foreign substances on the mask that do not require correction without any foreign substance removal or correction process such as wet cleaning.

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    5nm nanomachining photomask repair system RAVE nm-VI

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1 Models of 5nm nanomachining photomask repair system RAVE nm-VI

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5nm nanomachining photomask repair system RAVE nm-VI-Part Number-RAVE nm-VI

RAVE nm-VI

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Bruker Corporation

Response Rate

100.0%

Response Time

30.7hrs

Company Overview

Bruker, founded in 1960 and based in Billerica, Massachusetts, is a manufacturer and distributor of scientific...

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