Multiphoton stereolithography device MPF-330
Photoscience Co., Ltd.
About This Product
■Summary
This device is a multiphoton excitation stereolithography device that uses a femtosecond laser. By using ultrashort pulse laser light of 750 to 900 nm as an excitation light source, two-photon excitation of substances that absorb in the ultraviolet to visible region is possible. Nanoscale stereolithography can be performed with higher spatial resolution than conventional stereolithography using high-power lasers.
■Features
Conventional processing using high-power carbon dioxide lasers or YAG lasers converts light energy into thermal energy, and processes the irradiated area by thermally damaging it by melting or decomposing it, but processing using femtosecond lasers Because the energy itself is used, the material does not suffer thermal damage.
In addition, since the processing uses multiphoton excitation, only the interior can be processed three-dimensionally without damaging the material surface. Furthermore, since the multiphoton excitation process is a nonlinear optical phenomenon, processing resolution exceeding the diffraction limit can be obtained.
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Product
Multiphoton stereolithography device MPF-330
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Handling Company
Photoscience Co., Ltd.
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Categories
1 Models of Multiphoton stereolithography device MPF-330
| Product Image | Part Number | Price (excluding tax) |
|---|---|---|
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MPF-330 |
Available upon quote |
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About Company Handling This Product
- Japan