Photolithography materials Resist remover-N-327

Photolithography materials Resist remover
Nagase ChemteX Co., Ltd.

Nagase ChemteX Co., Ltd.'s Response Status

Response Rate

100.0%

Response Time

92.9hours

About This Product

Semiconductor devices are becoming ultra-fine, and flat panel displays are becoming more precise and highly functional. In the rapidly evolving world of semiconductor and flat panel manufacturing, we manufacture various products such as stripping agents, etchants (photosensitive materials), and resist stripping agents that require rapid development capabilities. We also have an excellent track record of providing proposals to customers in the area of ​​process management, contributing to the development of the electronics industry.

Model
There are 5 models available for this product.

Product
Photolithography materials Resist remover

Handling Company
Nagase ChemteX Co., Ltd.

Categories

Semiconductor Manufacturing

Photoacid Generators

Cleaning Agents & Equipment

Parting Agents

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Last viewed: 8 hours ago

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5 Models of Photolithography materials Resist remover

Click on the part number for more information about each product

Part Number	Price (excluding tax)	Viscosity mPa･s (25℃)	Purpose	Liquid	Laws and regulations Fire service law	Regulations PRTR	Peeling performance Residue removal	Peeling performance Positive removal	Operating conditions ℃/min	Rinse liquid	AL corrosive
N-327	Available upon quote	8	FPD	Water system	Not applicable	Not applicable	○	○	Normal temperature~50/1~5	Water	◎
N-342	Available upon quote	10	FPD	Water system	Not applicable	Applicable	◎	○	Normal temperature~50/1~5	Water	○
N-300	Available upon quote	10	FPD	Non-aqueous	Class 4 3 stones	Applicable	○	◎	60~120/1~20	Alcohol	◎
N-530	Available upon quote	3	Semiconductor	Non-aqueous	Class 4 3 stones	Applicable	◎	◎	80~100/10~20	Solvent	◎
N-530HS	Available upon quote	6	Semiconductor	Non-aqueous	Class 4 3 stones	Applicable	◎	◎	80~100/10~20	Solvent	◎

Click on the part number for more information about each product

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About Company Handling This Product

Nagase ChemteX Co., Ltd.

Response Rate

100.0%

Response Time

92.9hrs

Japan

Photolithography materials Resist remover Nagase ChemteX Co., Ltd.

Nagase ChemteX Co., Ltd.'s Response Status

About This Product

5 Models of Photolithography materials Resist remover

N-327

N-342

N-300

N-530

N-530HS

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About Company Handling This Product

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Photolithography materials Resist remover
Nagase ChemteX Co., Ltd.