Photolithography materials Resist remover
Nagase ChemteX Co., Ltd.
About This Product
Semiconductor devices are becoming ultra-fine, and flat panel displays are becoming more precise and highly functional. In the rapidly evolving world of semiconductor and flat panel manufacturing, we manufacture various products such as stripping agents, etchants (photosensitive materials), and resist stripping agents that require rapid development capabilities. We also have an excellent track record of providing proposals to customers in the area of process management, contributing to the development of the electronics industry.
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Product
Photolithography materials Resist remover
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Handling Company
Nagase ChemteX Co., Ltd.
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Categories
5 Models of Photolithography materials Resist remover
Items marked with have different values depending on the model number.
Click on the part number for more information about each product
| Product Image | Part Number | Price (excluding tax) | AL corrosive | Laws and regulations Fire service law | Liquid | Operating conditions ℃/min | Peeling performance Positive removal | Peeling performance Residue removal | Purpose | Regulations PRTR | Rinse liquid | Viscosity mPa･s (25℃) |
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N-327 |
Available upon quote | ◎ | Not applicable | Water system | Normal temperature~50/1~5 | ○ | ○ | FPD | Not applicable | Water | 8 |
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N-342 |
Available upon quote | ○ | Not applicable | Water system | Normal temperature~50/1~5 | ○ | ◎ | FPD | Applicable | Water | 10 |
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N-300 |
Available upon quote | ◎ | Class 4 3 stones | Non-aqueous | 60~120/1~20 | ◎ | ○ | FPD | Applicable | Alcohol | 10 |
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N-530 |
Available upon quote | ◎ | Class 4 3 stones | Non-aqueous | 80~100/10~20 | ◎ | ◎ | Semiconductor | Applicable | Solvent | 3 |
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N-530HS |
Available upon quote | ◎ | Class 4 3 stones | Non-aqueous | 80~100/10~20 | ◎ | ◎ | Semiconductor | Applicable | Solvent | 6 |
Click on the part number for more information about each product
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About Company Handling This Product
- Japan