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  4. Photolithography materials (photoresists) Photoresists for single layer lift-off process NPR9700 series (Nagase ChemteX Co., Ltd.)
Photolithography materials (photoresists) Photoresists for single layer lift-off process NPR9700 series-NPR9700 series
Photolithography materials (photoresists) Photoresists for single layer lift-off process NPR9700 series-Nagase ChemteX Co., Ltd.

Photolithography materials (photoresists) Photoresists for single layer lift-off process NPR9700 series
Nagase ChemteX Co., Ltd.

About This Product

In the rapidly evolving world of ultrafine semiconductor and flat panel manufacturing, manufacturing processes are becoming increasingly diverse, and the ability to rapidly develop applicable materials is required. We are developing a unique photoresist (photosensitive material) that is compatible with the lift-off process. The lift-off process has the advantage of not requiring a wiring process using metal etching, contributing to process shortening and reducing the amount of materials used. We also accept consultations on material development tailored to customers' individual needs and detailed requests.

■Features

・Positive resist for lift-off process ・Exposure wavelength range: G-line to I-line (broadband compatible) ・Easily form a reverse taper shape without using special processes ・Good removability ・We will propose film thickness, line width, shape, etc. according to your request.

■Applications

Compound semiconductors, optical devices, RF devices, difficult-to-etch materials

  • Product

    Photolithography materials (photoresists) Photoresists for single layer lift-off process NPR9700 series

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1 Models of Photolithography materials (photoresists) Photoresists for single layer lift-off process NPR9700 series

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Photolithography materials (photoresists) Photoresists for single layer lift-off process NPR9700 series-Part Number-NPR9700 series

NPR9700 series

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Nagase ChemteX Co., Ltd.

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