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Silicon wafer batch automatic cleaning equipmentHandling Company
PHT Co., Ltd.Categories
| Image | Part Number | Price (excluding tax) | HEPA or ULPA | LD&ULD | Wafer size | Wafer material | Optional equipment | Rinse tank | Robot | Drying | Processing time | Number of sheets processed | Treatment tank and configuration | Conveyance method | Cleaning method | Utility | Chemical solution | Chemical tank | Chemical temperature |
|---|---|---|---|---|---|---|---|---|---|---|---|---|---|---|---|---|---|---|---|
|
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SCC-250 |
Available upon quote |
Quantity determined by configuration |
Ionizer (optional) |
Φ200mm・φ300mm |
Silicon (compound semiconductors such as SiC require separate specifications meeting) |
Ozone generator |
Bubbling, QDR, resistivity meter installation |
Made by PHT or PHOENIX ENGINEERING: Vertical axis (AC servo drive) + Travel axis (AC servo drive) + Chuck mechanism (air drive) |
Hot water pulling, IR, spin dryer, marangony |
1 batch (25 or 50 sheets) takes 5 minutes (300sec) ~6 minutes (360sec). |
2 types: 25 sheets and 50 sheets |
Separate specifications meeting depending on line configuration |
Choose from carrier type or carrierless type |
The configuration of the cleaning tank is determined by the process used. |
Pure water, nitrogen (for air sensor), clean air, power supply, vacuum (for transportation) |
O₃・HF・NCW・KOH・NH₄OH・H₂O₂・HCL・EDTA・HCL・Citric acid・DIW |
Pendulum swing/rotation/ultrasonic |
Can handle up to 100℃ |
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Reviews shown here are reviews of companies.
