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Oxide Polishing Colloidal Silica Suspension 50nm Alkaline-Colloidal Silica Suspension 50nm Alkaline
Oxide Polishing Colloidal Silica Suspension 50nm Alkaline-AKASEL A/S

Oxide Polishing Colloidal Silica Suspension 50nm Alkaline
AKASEL A/S


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■Colloidal Silica Suspension 50nm Alkaline

Colloidal silica suspension for final polishing of metallographic samples.The suspension can be mixed with etchants to enhance the polishing action. Silica concentration 585g/l Median (50%) 50nm pH 9.5–10.5 Contains anti-drying agent.Shake before use

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    Oxide Polishing Colloidal Silica Suspension 50nm Alkaline

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1 Models of Oxide Polishing Colloidal Silica Suspension 50nm Alkaline

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Oxide Polishing Colloidal Silica Suspension 50nm Alkaline-Part Number-Colloidal Silica Suspension 50nm Alkaline

Colloidal Silica Suspension 50nm Alkaline

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1l,5l

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