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  4. FA semiconductor related system dry etcher APX300 (Panasonic Industry Co., Ltd.)
FA semiconductor related system dry etcher APX300-APX300
FA semiconductor related system dry etcher APX300-Panasonic Industry Co., Ltd.

FA semiconductor related system dry etcher APX300
Panasonic Industry Co., Ltd.

About This Product

The APX300 is a fully automatic batch processing dry etching system that can process multiple wafers of 6 inches or less at the same time, and can process ø4" x 7 and ø6" x 3 wafers at the same time.

■Features

・Using a unique ICP plasma source, high-precision and highly uniform processing is possible. ・Using a unique batch ESC electrode, each substrate is directly adsorbed, achieving high-speed etching processing with high precision at the level of single-wafer processing. ・Many achievements in processing compound material substrate material insulating film ・Contributing to improving high-area productivity with one-box equipment configuration (Equipment dimensions: W1,350 mm x D2,230 mm x H2,000 mm)

■Applications

・Applicable to LT/LN substrate etching and protective film etching processes of SAW devices ・High-speed processing of LED thin films contributes to high productivity in the etching process ・The substrate surface can be etched into shapes such as trapezoids and cones (PSS processing) Features/Effects

■Area where APX300 is useful

Businesses utilizing IoT are expected to further expand in the future as 5G becomes more widespread. The number of related information terminal devices is increasing year by year, requiring advances in high-speed communication, high-speed processing, and sensing functions, and the demands for functional evolution of various key devices are becoming even more sophisticated. In particular, the needs for high-precision processing performance, compatibility with new materials, and process stability are increasing for 5G-related SAW and communication devices that enable high-speed, high-capacity communications, MEMS and sensor devices that enable autonomous driving and smart factories, and light-emitting devices such as LEDs and LDs used for optical communications and 3D sensing. In particular, in substrate processing for SAW devices and LED/LD, there is a high demand for high productivity and improved area productivity for difficult-to-process materials, and high-precision, high-speed batch processing is required. Panasonic provides high performance and highly stable process solutions using batch processing equipment equipped with unique multi-ESC electrodes.

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    FA semiconductor related system dry etcher APX300

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1 Models of FA semiconductor related system dry etcher APX300

Image Part Number Price (excluding tax)
FA semiconductor related system dry etcher APX300-Part Number-APX300

APX300

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Panasonic Industry Co., Ltd.

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