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  4. High-performance vacuum evaporation equipment MPVAP (Microphase Co., Ltd.)
High-performance vacuum evaporation equipment MPVAP-MPVAP
High-performance vacuum evaporation equipment MPVAP-Microphase Co., Ltd.

High-performance vacuum evaporation equipment MPVAP
Microphase Co., Ltd.

Microphase Co., Ltd.'s Response Status

Response Rate

100.0%

Response Time

126.2hours

About This Product

Equipped with a 360-degree rotating cubic substrate holder invented by our company, the sample installation area has been increased by four times. Samples with four film formation conditions can be created in one process without breaking the vacuum. This is a very useful function for investigating film thickness dependence and deposition condition dependence. When performing vapor deposition on the surface of a three-dimensional sample, such as preparing a sample for SEM observation, by rotating the sample holder while performing vapor deposition, it is possible to achieve vapor deposition from each direction of the three-dimensional sample, allowing clear SEM stereoscopic observation. becomes possible. Furthermore, by attaching a dedicated vertical holder, it is possible to deposit on both sides of the substrate in a single process. In addition, by making good use of this rotating holder, it is possible to avoid the problem of fluctuations in radiant heat to the film thickness sensor due to the opening and closing of the evaporation source shutter, allowing you to obtain faithful and precise film thickness data. This is a technical topic, but the film thickness display data of the commonly used quartz crystal film thickness monitors responds sensitively to temperature fluctuations in the sensor. At the moment when the evaporation source shutter is opened and closed, fluctuations in the radiant heat from the high-temperature evaporation crucible to the sensor occur at the same time, so the data shown differs from the actual film thickness. When using a rotating holder, if you leave the shutter open from the beginning and rotate the cubic holder when the temperature of the evaporation source crucible reaches an equilibrium state, you can start and finish evaporation on the substrate, and the sensor No fluctuations in radiant heat occur.

■Purpose

This is a vacuum evaporation device that can deposit various metal thin films on the surface of a substrate-like sample and accurately control the film thickness.

■Features:

・Equipped with our uniquely developed 360℃ rotating cubic sample holder, which improves vapor deposition efficiency by 4 times ・Equipped with a crystal oscillation type film thickness monitor, synergistic effect with the above holder allows for more precise control of film thickness. ・With the above holder, oblique vapor deposition and double-sided vapor deposition are possible. ・Equipped with two types of evaporation sources, capable of forming multilayer films ・Easy to operate with automatic start button

  • Product

    High-performance vacuum evaporation equipment MPVAP

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1 Models of High-performance vacuum evaporation equipment MPVAP

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High-performance vacuum evaporation equipment MPVAP-Part Number-MPVAP

MPVAP

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About Company Handling This Product

Microphase Co., Ltd.

Response Rate

100.0%

Response Time

126.2hrs

Company Overview

Microphase Co. Ltd., established in 1999 and headquartered in Ibaraki, Japan, is a manufacturer of nanotechnol...

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  • Japan

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Vacuum Vapor Deposition Devices　Microphase Co., Ltd.
Microphase Co., Ltd.

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