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■Semi-closed plate type retention area reduction system

While ensuring cleanliness in the required areas, we can reduce the cost and save energy of clean rooms.

■Summary

By returning a portion of the clean room air into the ceiling chamber through the ventilation resistor, the stagnation area that forms directly under the ceiling closing panel is efficiently reduced, and a clean space is efficiently created with a small number of fan filter units.

■Features

・Suppressing the stagnation of airflow in the clean room. ・Reduction of effective ventilation frequency. ・Reduced number of fan filter units (FFU) installed.

■Local cleaning technology (mini environment)

By keeping only the local space around the product highly clean and relaxing the cleanliness of the entire clean room, you can reduce investment and running costs.

■Technical configuration

We propose cost reductions by minimizing clean rooms by utilizing mini-environments (enclosed clean spaces). (Constructed Japan's first 300Φ wafer semiconductor manufacturing clean room using this method.) We propose a local cleanliness clean room with appropriately placed eyelids (hanging walls) and diffused air outlets.

■Return ductless clean room

We aim to improve the production efficiency of the factory by expanding the clean room area and expanding the production area.

■Summary

For state-of-the-art semiconductor mass production lines, we have developed a return ductless clean room that can satisfy the cleanliness and temperature distribution inside the clean room even without a return duct. The area occupied by the return duct can also be used as a production area, making it possible to construct a clean room with good area efficiency.

■Features

・Airflow control by eyelid and mini-environment placement - Sensible heat inside the room is removed by a sensible heat processing coil on the ceiling side.

■Application field

Semiconductor factories that handle 300φ wafers, etc.

  • Product

    Low cost clean room

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Low cost clean room

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