■Single-wafer coating. Uniform coating possible in a short time with a small amount of sample
The single-wafer coating method enables uniform coating in a short time using a small amount of sample (paint). When coating, you can arbitrarily adjust the interval, coating speed, dwell time, hot air drying wind direction, wind speed, etc.
It is also a single-wafer coater that can perform hand coating, which has traditionally been done.
■Main specifications
・Drying room dimensions: 400 (W) × 640 (D) × 200 (H) mm
・Drying room dimensions: 350 (W) × 620 (D) × 75 (H) mm
・Effective sample width: A3 297 (W) × 420 (D) mm
・Coating speed: 1-60m/min
・Drying time: 10~300sec
・Hot air blower: AC200V 3φ 300W blower 1.2m³/min 800mmAq
・Coating drive device: Transistor inverter control
・Transport drive device: Transistor inverter control
・Electrical capacity: 6.6kW
・Power supply: AC200V 3φ 50/60Hz 30A
・External dimensions: 780 (W) × 2,250 (D) × 1,300 (H) mm
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