This device was developed as an evaporation device suitable for all metals, including Mg alloys, using an electron beam in a clean high vacuum for the purpose of progressive sample preparation.
■Features
・The vacuum exhaust system is a combination of TMP80L/sec and RP50L/min, and is a fully automatic exhaust system that uses electromagnetic valves.
・The ultimate pressure reaches 10 -5Pa without a liquid nitrogen trap.
・Metal coating and shadowing use ultrafine particle deposition to improve resolution.
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