Fractured surface vapor deposition protective film forming equipment FDP-500-II type
Atotech Co., Ltd.
About This Product
This device was developed to vacuum deposit Ni, etc. on the fractured surface immediately after breaking various metals, alloy materials, etc. by mechanical impact at low temperatures (~100K) in an extremely high vacuum (X10-9Pa). It is a device. In addition, since the fracture surface caused by brittle fracture of the material can be protected as it is, various analyzes of the fracture surface can be performed by 3D atom probe observation, etc.
■Configuration
・Main chamber
・Sample exchange room
・Vacuum exhaust system RP (150L/min), TMP (550L/sec, 60L/sec), gate valve (CF203, CF152) Actor pump (ULVAC), (PST-200AXII type N20.2m3/s)
・Extreme high vacuum gauge AXTRAN (ULVAC) (10-11Pa level)
・K cell type evaporation source
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Product
Fractured surface vapor deposition protective film forming equipment FDP-500-II type
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Handling Company
Atotech Co., Ltd.
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Categories
1 Models of Fractured surface vapor deposition protective film forming equipment FDP-500-II type
| Product Image | Part Number | Price (excluding tax) |
|---|---|---|
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FDP-500-Ⅱ type |
Available upon quote |
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About Company Handling This Product
- Japan