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  2. RF radical beam source IRFS (Arios Co., Ltd.)
RF radical beam source IRFS-IRFS-301
RF radical beam source IRFS-Arios Co., Ltd.

RF radical beam source IRFS
Arios Co., Ltd.

Arios Co., Ltd.'s Response Status

Response Rate

100.0%

Response Time

1.7hours

Very Fast Response

About This Product

■Summary

IRFS-301 is equipped with a maximum power supply of 300W, but compared to IRFS-504, it is a slimmer and lower output radical beam source. Therefore, the price is more affordable than IRFS-504. The basic configuration is the same as IRFS-504, and the discharge section and extraction section are made of high-purity PBN (for nitrogen), allowing stable operation for long periods of time even when active gas is introduced, and clean atomic and radical beams. You can get

■Features

・Equipped with a viewport as standard that allows you to visually check the discharge. ・You can check the discharge state and excitation state using a luminescence monitor or spectrometer. ・Completely metal sealed and bakeable at 200℃, so it can be used in various ultra-high vacuum devices such as MBE devices. ・Since it is designed to be installed on a molecular beam cell port, it can be added to a conventional MBE device.

■Standard configuration

・IRFS-301 RF radical source body (with automatic matching device) 1 unit ・RP-301 RF power supply 1 unit ・Cables (reference to power supply specification standard accessories) 1 set

■AM modulation system for high quality nitride film production

In the MBE system, by controlling the molecular beam cell shutter timing and the RF power of the radical source and appropriately selecting the excited plasma mode, it is possible to form high-quality nitride compound epitaxial growth films. This system repeatedly controls the output of the RF power supply to HIGH/LOW according to the settings. You can also set the repetition time and timing. It also controls the matching box and prevents mismatching.

  • Product

    RF radical beam source IRFS

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1 Models of RF radical beam source IRFS

Image Part Number Price (excluding tax) Mass Maximum exit aperture Matching box Discharge chamber Connection flange Cooling method Baking Gas inlet
RF radical beam source IRFS-Part Number-IRFS-301

IRFS-301

Available upon quote

9.5 kg

Φ15mm

Automatic matching box

Made of PBN (or made of quartz - for oxygen)

Φ114CF

Radical source: Water cooling (0.5 L⁄min or more)
1⁄4 SwagelokTM or Rc 1⁄8 connection
Matching unit: Forced air cooling

Maximum 200℃ (excluding matching box cable)

1⁄4 VCRTM male

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About Company Handling This Product

Arios Co., Ltd.

Response Rate

100.0%

Response Time

1.7hrs

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