All Categories

History

  1. Metoree
  2. RF plasma source ERFS-501 (Arios Co., Ltd.)
RF plasma source ERFS-501-ERFS-501
RF plasma source ERFS-501-Arios Co., Ltd.

RF plasma source ERFS-501
Arios Co., Ltd.

Arios Co., Ltd.'s Response Status

Response Rate

100.0%

Response Time

1.7hours

Very Fast Response

About This Product

■Summary

This plasma source uses ICP type RF high-density plasma to process various raw material gases and can be used for film formation experiments, etching experiments, etc. The plasma chamber is made of quartz, and electrodeless discharge enables processes with less metal contamination. It can operate stably for a long time even when active gas is introduced, and can obtain clean atoms, radical beams, etc.

■Features

・High-precision plasma emission spectroscopy is possible with the viewing port. - Automatic matching mechanism allows for easy operation and stable operation for long periods of time. ・Since it is air-cooled and does not require cooling water, it can be easily installed into existing equipment. ・We have confirmed the spectral data of nitrogen radical atoms, and it can be used as a nitrogen radical source.

■Standard configuration

・RF radical source main body (ERFS-501) with automatic matching box and manual controller 1 unit ・RF power supply (RP-502) 1 unit ・1 set of cables

  • Product

    RF plasma source ERFS-501

Share this product


10+ people viewing

Free
Get started with our free quotation service - no cost, no obligation.

No Phone Required
We respect your privacy. You can receive quotes without sharing your phone number.

1 Models of RF plasma source ERFS-501

Image Part Number Price (excluding tax) Mass Maximum exit aperture Matching box Discharge chamber material Connection flange Cooling method Baking temperature Plasma excitation method Gas introduction system RF output
RF plasma source ERFS-501-Part Number-ERFS-501

ERFS-501

Available upon quote

Approximately 9.5kg

Φ28mm

Automatic matching box (manual controller attached)

Made of transparent quartz

VG80 or CF114

Forced air cooling

Maximum 150℃ (excluding cable and matching box)

Inductive Coupling (ICP)

1/4 VCRTM male

0~500W 13.56MHz ± 1kHz

Other products of Arios Co., Ltd.

Reviews shown here are reviews of companies.

Ultra-high vacuum pumping equipment UHVPS-Arios Co., Ltd.

Ultra-high vacuum pumping equipment UHVPS

Arios Co., Ltd.

220+ people viewing

Last viewed: 6 hours ago

Response time: 1.69 hours

Vacuum Generators

3 models listed

MBE equipment-Arios Co., Ltd.

MBE equipment

Arios Co., Ltd.

190+ people viewing

Last viewed: 11 hours ago

Response time: 1.69 hours

Vacuum Vapor Deposition Devices

2 models listed

Microwave plasma experimental equipment MiPC-1000-Arios Co., Ltd.

Microwave plasma experimental equipment MiPC-1000

Arios Co., Ltd.

140+ people viewing

Last viewed: 3 hours ago

Response time: 1.69 hours

Plasma Cleaning Systems
RF plasma experimental equipment RFPC-550-Arios Co., Ltd.

RF plasma experimental equipment RFPC-550

Arios Co., Ltd.

130+ people viewing

Response time: 1.69 hours

Plasma Cleaning Systems
MP-CVD equipment for diamond synthesis DCVD-301B/601B-Arios Co., Ltd.

MP-CVD equipment for diamond synthesis DCVD-301B/601B

Arios Co., Ltd.

210+ people viewing

Last viewed: 33 minutes ago

Response time: 1.69 hours

Plasma-Enhanced CVD

3 models listed

HF-CVD equipment for diamond synthesis HFCVD series-Arios Co., Ltd.

HF-CVD equipment for diamond synthesis HFCVD series

Arios Co., Ltd.

170+ people viewing

Last viewed: 9 hours ago

Response time: 1.69 hours

Deposition Equipment

2 models listed

Small sputtering equipment SS-DC RF301-Arios Co., Ltd.

Small sputtering equipment SS-DC RF301

Arios Co., Ltd.

190+ people viewing

Last viewed: 6 hours ago

Response time: 1.69 hours

Sputtering Equipment

2 models listed

Plasma CVD experimental equipment PCVD-R100-Arios Co., Ltd.

Plasma CVD experimental equipment PCVD-R100

Arios Co., Ltd.

160+ people viewing

Last viewed: 10 hours ago

Response time: 1.69 hours

Plasma-Enhanced CVD

3 models listed

Hetero epitaxial growth equipment for diamond substrates-Arios Co., Ltd.

Hetero epitaxial growth equipment for diamond substrates

Arios Co., Ltd.

130+ people viewing

Last viewed: 1 hour ago

Response time: 1.69 hours

Crystallizers
Drum sputtering equipment for particle surface film formation-Arios Co., Ltd.

Drum sputtering equipment for particle surface film formation

Arios Co., Ltd.

160+ people viewing

Last viewed: 22 hours ago

Response time: 1.69 hours

Vacuum Vapor Deposition Devices

3 models listed

Load lock hatch ED series-Arios Co., Ltd.

Load lock hatch ED series

Arios Co., Ltd.

100+ people viewing

Last viewed: 1 hour ago

Response time: 1.69 hours

Vacuum photoluminescence evaluation device-Arios Co., Ltd.

Vacuum photoluminescence evaluation device

Arios Co., Ltd.

160+ people viewing

Last viewed: 10 hours ago

Response time: 1.69 hours

Spectroscopic Analyzer

2 models listed


View more products of Arios Co., Ltd.

About Company Handling This Product

Arios Co., Ltd.

Response Rate

100.0%

Response Time

1.7hrs

  • Japan

This is the version of our website addressed to speakers of English in the United States. If you are a resident of another country, please select the appropriate version of Metoree for your country in the drop-down menu.

Copyright © 2025 Metoree