All Categories

History

  1. Metoree
  2. Compact microwave ion source EMIS-111Q (Arios Co., Ltd.)
Compact microwave ion source EMIS-111Q-EMIS-111Q
Compact microwave ion source EMIS-111Q-Arios Co., Ltd.

Compact microwave ion source EMIS-111Q
Arios Co., Ltd.

Arios Co., Ltd.'s Response Status

Response Rate

100.0%

Response Time

1.7hours

Very Fast Response

About This Product

■Summary

EMIS-111Q is a quartz discharge tube type compact microwave-excited ion source. It is more compact than the microwave ion source (EMIS-211C), has a more specialized design as an ion source, and can obtain more ion current.

■Features

・The plasma chamber is made of quartz and discharge can be visually observed. ・The 3-electrode structure allows a high-current ion beam to be obtained using low-power microwaves. ・With the neutralizer (optional), it can also be used on insulating materials. - All parts of the plasma chamber that come into contact with the plasma are made of insulators (alumina + quartz), which minimizes impurity contamination. - Completely shielded structure makes it extremely safe against microwave leakage. - Completely air-cooled, no cooling water required. ・Various active gases can be used. - Microwaves are supplied via coaxial cable, eliminating the need for troublesome waveguide connections.

■Application examples

・Ion beam sputtering ・Ion doping ·etching ・Film formation assist

■Standard configuration

・Plasma source body (EMIS-111Q) ・200W microwave power supply (MP-201B) ・2kV ion acceleration power supply, accelerator grid power supply ・Cables (reference to MP-201B standard accessories) 1 set

■Options

・Filament type neutralizer *A neutralizer is also available as an option. This makes it possible to use insulating substrates.

  • Product

    Compact microwave ion source EMIS-111Q

Share this product


50+ people viewing

Last viewed: 9 hours ago

Free
Get started with our free quotation service - no cost, no obligation.

No Phone Required
We respect your privacy. You can receive quotes without sharing your phone number.

1 Models of Compact microwave ion source EMIS-111Q

Image Part Number Price (excluding tax) Mass Vacuum sealing Discharge chamber diameter Discharge chamber Connection flange Cooling method Microwave input Baking Grid hole diameter Gas inlet
Compact microwave ion source EMIS-111Q-Part Number-EMIS-111Q

EMIS-111Q

Available upon quote

1.9kg

O-ring seal (discharge tube part)

Φ26mm

Quartz

Φ114CF

Forced air cooling method (cooling fan)

MAX 150W

Maximum 150℃ (flange part only)

Φ2.8mm×19

1/4 VCRTM or 1/4 SwagelokTM

Other products of Arios Co., Ltd.

Reviews shown here are reviews of companies.

Ultra-high vacuum pumping equipment UHVPS-Arios Co., Ltd.

Ultra-high vacuum pumping equipment UHVPS

Arios Co., Ltd.

90+ people viewing

Last viewed: 5 hours ago

Response time: 1.69 hours

Vacuum Generators

2 models listed

MBE equipment-Arios Co., Ltd.

MBE equipment

Arios Co., Ltd.

90+ people viewing

Last viewed: 1 hour ago

Response time: 1.69 hours

Vacuum Vapor Deposition Devices

2 models listed

Microwave plasma experimental equipment MiPC-1000-Arios Co., Ltd.

Microwave plasma experimental equipment MiPC-1000

Arios Co., Ltd.

70+ people viewing

Last viewed: 13 minutes ago

Response time: 1.69 hours

Plasma Cleaning Systems
RF plasma experimental equipment RFPC-550-Arios Co., Ltd.

RF plasma experimental equipment RFPC-550

Arios Co., Ltd.

60+ people viewing

Last viewed: 14 hours ago

Response time: 1.69 hours

Plasma Cleaning Systems
MP-CVD equipment for diamond synthesis DCVD-301B/601B-Arios Co., Ltd.

MP-CVD equipment for diamond synthesis DCVD-301B/601B

Arios Co., Ltd.

90+ people viewing

Last viewed: 6 hours ago

Response time: 1.69 hours

Plasma-Enhanced CVD

3 models listed

HF-CVD equipment for diamond synthesis HFCVD series-Arios Co., Ltd.

HF-CVD equipment for diamond synthesis HFCVD series

Arios Co., Ltd.

70+ people viewing

Last viewed: 2 hours ago

Response time: 1.69 hours

Deposition Equipment

2 models listed

Small sputtering equipment SS-DC RF301-Arios Co., Ltd.

Small sputtering equipment SS-DC RF301

Arios Co., Ltd.

90+ people viewing

Last viewed: 9 hours ago

Response time: 1.69 hours

Sputtering Equipment

2 models listed

Plasma CVD experimental equipment PCVD-R100-Arios Co., Ltd.

Plasma CVD experimental equipment PCVD-R100

Arios Co., Ltd.

70+ people viewing

Last viewed: 5 hours ago

Response time: 1.69 hours

Plasma-Enhanced CVD

3 models listed

Hetero epitaxial growth equipment for diamond substrates-Arios Co., Ltd.

Hetero epitaxial growth equipment for diamond substrates

Arios Co., Ltd.

60+ people viewing

Last viewed: 5 hours ago

Response time: 1.69 hours

Crystallizers
Drum sputtering equipment for particle surface film formation-Arios Co., Ltd.

Drum sputtering equipment for particle surface film formation

Arios Co., Ltd.

80+ people viewing

Response time: 1.69 hours

Vacuum Vapor Deposition Devices

3 models listed

Load lock hatch ED series-Arios Co., Ltd.

Load lock hatch ED series

Arios Co., Ltd.

50+ people viewing

Last viewed: 11 minutes ago

Response time: 1.69 hours

Vacuum photoluminescence evaluation device-Arios Co., Ltd.

Vacuum photoluminescence evaluation device

Arios Co., Ltd.

70+ people viewing

Last viewed: 6 hours ago

Response time: 1.69 hours

Spectroscopic Analyzer

2 models listed


View more products of Arios Co., Ltd.

About Company Handling This Product

Arios Co., Ltd.

Response Rate

100.0%

Response Time

1.7hrs

  • Japan

This is the version of our website addressed to speakers of English in the United States. If you are a resident of another country, please select the appropriate version of Metoree for your country in the drop-down menu.

Copyright © 2024 Metoree