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  2. Microwave ion source EMIS-221C (Arios Co., Ltd.)
Microwave ion source EMIS-221C-EMIS-221C
Microwave ion source EMIS-221C-Arios Co., Ltd.

Microwave ion source EMIS-221C
Arios Co., Ltd.

Arios Co., Ltd.'s Response Status

Response Rate

100.0%

Response Time

1.7hours

Very Fast Response

About This Product

■Summary

EMIS-221C is a ceramic discharge tube type, external chamber type, magnetic field type microwave excited ion source. Ultra-high vacuum specifications provide ions with less metal contamination. Ideal for ion doping, etching, and film formation assist applications.

■Features

・The plasma chamber is made of high-purity alumina, allowing you to obtain ions with little metal contamination. ・With a complete metal seal structure, it can be used in various ultra-high vacuum equipment such as MBE equipment. ・Ion acceleration is possible by using a high voltage power supply for acceleration (optional). (Can also be used as a radical source or plasma source.) - Microwaves are supplied via coaxial cable, eliminating the need for troublesome waveguide connections. - External control is possible using a sequencer or PC.

■Standard configuration

・EMRS-221C ion source 1 unit ・MP-201B 200W microwave power supply 1 unit ・Cables (reference to MP-201B standard accessories) 1 set

  • Product

    Microwave ion source EMIS-221C

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1 Models of Microwave ion source EMIS-221C

Image Part Number Price (excluding tax) Mass Igniter Maximum exit aperture Connection flange Cooling method Baking Gas introduction system
Microwave ion source EMIS-221C-Part Number-EMIS-221C

EMIS-221C

Available upon quote

5.5kg

High voltage pulse application type (automatic)

50mm

Φ114CF

Forced air cooling (no cooling water required)

Maximum 200℃ (waveguide section maximum 60℃)

Φ34CF port 2 systems

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About Company Handling This Product

Arios Co., Ltd.

Response Rate

100.0%

Response Time

1.7hrs

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