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Gridless ion source GLIS series-GLIS-C12
Gridless ion source GLIS series-Arios Co., Ltd.

Gridless ion source GLIS series
Arios Co., Ltd.

Arios Co., Ltd.'s Response Status

Response Rate

100.0%

Response Time

1.7hours

Very Fast Response


About This Product

■Summary

This ion beam source is a DC discharge type gridless ion source. It has an extremely simple structure based on the operating principle of simultaneous ion generation and ion acceleration. Stable operation is possible even under low pressure conditions due to the strong magnetic circuit and electrode structure. Ideal for cleaning substrates, etc. It can also be used with insulating materials by using an optional neutralizer.

■Application examples

・Substrate cleaning of film forming equipment ・Cleaning of analyzer substrate ・Ion beam sputtering

■Ion current density conditions

・Electrode-probe distance: 60mm ・Exhaust system: 260L/s TMP (N2) +250L/min DP ・Pressure: 3.7×10^-2Pa (Ar.1sccm) 7.0×10^-2Pa (Ar.2sccm)

■Standard configuration

・Ion source body ・Dedicated 2kV DC power supply (DCPS-201) ・One set of cables

■Options

・Filament neutralizer ・Ignition device (high voltage pulse application type [automatic])

  • Product

    Gridless ion source GLIS series

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1 Models of Gridless ion source GLIS series

Image Part Number Price (excluding tax) Insulator Discharge chamber Connection flange Acceleration voltage Cooling method Baking Gas inlet Ion irradiation port
Gridless ion source GLIS series-Part Number-GLIS-C12

GLIS-C12

Available upon quote

Alumina

SUS

Φ70CF

MAX 2,000V

Natural air cooling

Maximum 200℃

1/4 VCRTM

Φ12mm *Shape can be changed

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About Company Handling This Product

Response Rate

100.0%


Response Time

1.7hrs

  • Japan

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