Enhanced X'pert Platform X'pert³ Series X'pert³ Mrd (Spectory)
Enhanced X'pert Platform X'pert³ Series X'pert³ Mrd
Spectory
This product is registered by Spectory.
About This Product
■ Multipurgain research and development XRD system
MalverN Panalytical's Materials Investigation Division (MRD), which has a long history and high praise, is also used in new generation X'pert³ Mrd and X'pert³ MRD XL. The improved performance and reliability of the new platform will enhance the analysis and functions for the X -ray scattering method research and respond to the following fields.
・ State -of -the -art material science
・ Science and industrial thin film technology
・ Evaluation of measurement characteristics in semiconductor process development
Both systems deal with a wide range of applications by complete wafer mapping up to 100 mm (x'pert³ Mrd) or 200 mm (X'pert³ Mrd XL).
■ Flexibility of excellent systems that meet future needs
The X'PERT³ MRD system provides advanced and innovative X -ray fold solutions, from research to process development and process management. With the technology used, all the system fields can be upgraded to support all existing options and new functions of future hardware and software.
■ X'PERT³ Mrd
It is a standard research and development version, covering thin film samples, wafers (up to 100 mm full mapping), and solid substances. The high -resolution analysis function is improved by the outstanding accuracy of the new high -solution goniometer, which uses Heiden Hine Corder.
■ X'PERT³ MRD XL
X'pert³ MRD XL is a product that meets all high -solution XRD analysis capabilities required in each field of semiconductors, thin films, and cutting -edge materials. A full wafer mapping up to 200 mm X'Pert3 version is equipped with an incidental optical component (CRISP), which boasts the longest useful period, and has achieved the maximum operating time with the air pressure shutter and beam attenuator.
The X'pert³ MRD XL, which can analyze up to 300 mm diameter with a sophisticated automatic wafer loading option, functions as an advanced tool that supports the quality control of the multilayer thin film structure.
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