Oxide substrate for thin film growth LSAT-LSATｰASｰ10N

Oxide substrate for thin film growth LSAT
Shinkosha Co., Ltd.

Shinkosha Co., Ltd.'s Response Status

Response Rate

100.0%

Response Time

30.1hours

Relatively Fast Response

About This Product

■Since the 1980s, our company has continued to contribute to the advancement of science and technology, including providing SrTiO3 and sapphire substrates as substrates for high-temperature superconducting thin films and GaN.For epitaxial growth substrates, the presence or absence of crystal lattice distortion on the outermost surface is important, as well as crystallinity, smoothness and flatness of the substrate surface. Based on our accumulated technology over many years, we carry out integrated production in-house, from crystal growth (with the exception of some crystals) to processing.Using high-precision processing technology, we can finish the surface of a high-quality crystal substrate without any processed distortion layers. I am.

We provide oxide crystal substrates that are ideal for epitaxial growth of dielectrics, superconductors, compound semiconductors, etc.

■LSATLSAT has a 1/2 lattice constant of 0.3868 nm, which matches well with high-temperature superconductors and other high-performance oxides. Unlike LaAlO3, LSAT does not contain twins and can be grown using the CZ method, so it is larger than SrTiO3. Good crystallinity can be obtained. Please feel free to use it for your research.

■Physical properties・Composition (LaAlO3) 0.3- (SrAl0.5Ta0.5O3) 0.7
・Crystal system cubic crystal
・Crystal structure Perovskite structure
・Lattice constant a=0.7736 nm (a/2=0.3868 nm)
・Melting point 1,840℃
・Density 6.79 g/cm3 (20 ℃)
・Dielectric constant 22 (27℃, 1MHz)

■Options・OFF board
・Break grooved board

Model
There is 1 model available for this product.

Product
Oxide substrate for thin film growth LSAT

Handling Company
Shinkosha Co., Ltd.

Categories

Semiconductor Manufacturing

Semiconductor Materials

90+ people viewing

Last viewed: 5 hours ago

Free
Get started with our free quotation service - no cost, no obligation.

No Phone Required
We respect your privacy. You can receive quotes without sharing your phone number.

1 Models of Oxide substrate for thin film growth LSAT

Image	Part Number	Price (excluding tax)	Surface orientation (tolerance: ±0.5°)	Surface roughness	Surface treatment	Polishing	Orifla
	LSATｰASｰ10N	Available upon quote	-100	Ra≦1.0 nm Rmax≦5.0 nm	Standard	Single side polishing	-10

Customers who viewed this product also viewed

Reviews shown here are reviews of companies.

2 inch GaN template

Toyominato Co., Ltd.

1160+ people viewing

Last viewed: 37 minutes ago

Response time: 7.69 hours

Semiconductor Materials

4 models listed

Solid state relay for printed circuit board JCP SERIES

JEL SYSTEM CO,LTD.

220+ people viewing

Last viewed: 17 hours ago

Response time: 15.84 hours

Semiconductor Materials

5 models listed

4 inch GaN template

Toyominato Co., Ltd.

290+ people viewing

Last viewed: 37 minutes ago

Response time: 7.69 hours

Semiconductor Materials

2 models listed

Solid state relay control panel mounting type S5 SERIES

JEL SYSTEM CO,LTD.

170+ people viewing

Last viewed: 15 hours ago

Response time: 15.84 hours

Semiconductor Materials

4 models listed

Semiconductor materials Silicon doped materials

Yamanaka Advanced Material Co., Ltd.

150+ people viewing

Last viewed: 12 hours ago

Response time: 63.18 hours

Semiconductor Materials

GaN wafer (φ2 inch) Free-Standing GaN Substrate

Toyominato Co., Ltd.

1150+ people viewing

Last viewed: 37 minutes ago

Response time: 7.69 hours

Semiconductor Materials

4 models listed

Solid state relay with integrated heatsink F1 SERIES

JEL SYSTEM CO,LTD.

160+ people viewing

Last viewed: 7 hours ago

Response time: 15.84 hours

Semiconductor Materials

3 models listed

Silicon ingot/wafer

Shinyo Co., Ltd.

140+ people viewing

Last viewed: 14 hours ago

Semiconductor Materials

2 models listed

Digital interface GPIO expander

Silicon Device Co., Ltd.

110+ people viewing

Last viewed: 12 hours ago

Response time: 71.47 hours

Semiconductor Materials

3 models listed

GaN wafer Non-polar GaN square substrate (A side & M side)

Toyominato Co., Ltd.

1280+ people viewing

Last viewed: 37 minutes ago

Response time: 7.69 hours

Semiconductor Materials

4 models listed

Semiconductor materials CVD/diffusion/SiC coating materials

Yamanaka Advanced Material Co., Ltd.

110+ people viewing

Last viewed: 14 hours ago

Response time: 63.18 hours

Semiconductor Materials

Silicon epitaxial wafer

Shinyo Co., Ltd.

110+ people viewing

Last viewed: 9 hours ago

Semiconductor Materials

2 models listed

See More Semiconductor Materials Products

Other products of Shinkosha Co., Ltd.

Reviews shown here are reviews of companies.

Sapphire processed product [Scube®] Sapphire window standard product

Shinkosha Co., Ltd.

70+ people viewing

Last viewed: 5 minutes ago

Response time: 30.09 hours

Sapphire crystal for watches

Shinkosha Co., Ltd.

70+ people viewing

Last viewed: 17 hours ago

Response time: 30.09 hours

Sapphire substrate

Shinkosha Co., Ltd.

70+ people viewing

Last viewed: 3 minutes ago

Response time: 30.09 hours

Alumina vapor deposition material crushed type

Shinkosha Co., Ltd.

110+ people viewing

Last viewed: 22 hours ago

Response time: 30.09 hours

Alumina

Alumina vapor deposition material cutting type

Shinkosha Co., Ltd.

90+ people viewing

Last viewed: 22 hours ago

Response time: 30.09 hours

Alumina

Alumina vapor deposited material meniscus type

Shinkosha Co., Ltd.

110+ people viewing

Last viewed: 22 hours ago

Response time: 30.09 hours

Alumina

Oxide substrate for thin film growth Strontium titanate

Shinkosha Co., Ltd.

110+ people viewing

Last viewed: 14 hours ago

Response time: 30.09 hours

Semiconductor Materials

Oxide substrate for thin film growth Titanium oxide (rutile)

Shinkosha Co., Ltd.

100+ people viewing

Last viewed: 14 hours ago

Response time: 30.09 hours

Semiconductor Materials

Oxide substrate for thin film growth Sapphire

Shinkosha Co., Ltd.

70+ people viewing

Last viewed: 22 hours ago

Response time: 30.09 hours

Semiconductor Materials

Oxide substrate for thin film growth neodygallate

Shinkosha Co., Ltd.

70+ people viewing

Last viewed: 11 hours ago

Response time: 30.09 hours

Semiconductor Materials

Rutile prism

Shinkosha Co., Ltd.

80+ people viewing

Last viewed: 3 hours ago

Response time: 30.09 hours

Optical Prisms

Optical 1μm band isolator for fiber laser

Shinkosha Co., Ltd.

90+ people viewing

Last viewed: 8 hours ago

Response time: 30.09 hours

Photocouplers

3 models listed

View more products of Shinkosha Co., Ltd.

About Company Handling This Product

Shinkosha Co., Ltd.

Response Rate

100.0%

Response Time

30.1hrs

Japan

Related search keywords

This is the version of our website addressed to speakers of English in the United States. If you are a resident of another country, please select the appropriate version of Metoree for your country in the drop-down menu.

Oxide substrate for thin film growth LSAT Shinkosha Co., Ltd.

Shinkosha Co., Ltd.'s Response Status

About This Product

■Since the 1980s, our company has continued to contribute to the advancement of science and technology, including providing SrTiO3 and sapphire substrates as substrates for high-temperature superconducting thin films and GaN.

■LSAT

■Physical properties

■Options

1 Models of Oxide substrate for thin film growth LSAT

LSATｰASｰ10N

Customers who viewed this product also viewed

Other products of Shinkosha Co., Ltd.

About Company Handling This Product

Related search keywords

Oxide substrate for thin film growth LSAT
Shinkosha Co., Ltd.