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  4. Semiconductor manufacturing equipment Compatible with high-definition photomasks Photomask cleaning equipment Spin type cleaning equipment WULF series (M.WATANABE & CO.,LTD.)
Semiconductor manufacturing equipment Compatible with high-definition photomasks Photomask cleaning equipment Spin type cleaning equipment WULF series-WULF series
Semiconductor manufacturing equipment Compatible with high-definition photomasks Photomask cleaning equipment Spin type cleaning equipment WULF series-M.WATANABE & CO.,LTD.

Semiconductor manufacturing equipment Compatible with high-definition photomasks Photomask cleaning equipment Spin type cleaning equipment WULF series
M.WATANABE & CO.,LTD.

About This Product

Equipped with a spin cleaning unit that uses functional water. Adoption of cleaning solution and cleaning method that replaces RCA cleaning solution The cleaning equipment of our group companies contributes to the high cleanliness and yield improvement of photomask/reticle products, and cooperates with the production of products with a higher level of perfection.

■Basic information

As LSI performance improves, photomasks/reticles are required to have higher definition and precision. Our cleaning equipment contributes to making these products highly clean and improving yields, helping us produce products with a higher level of perfection. Equipped with a spin cleaning unit that uses functional water, this unit can remove organic matter, metal ions, and foreign matter to the detection limit level by using the centrifugal force of rotating the workpiece and the discharge of ozonated water and ammonia-added hydrogen water. By switching between each cleaning liquid for cleaning, it is an environmentally friendly tool that quickly removes impurity deposits on the workpiece and also provides safe waste liquid management.

■Features

・Contributes to high cleanliness and yield improvement ・Can remove organic substances, metal ions, and foreign substances to the detection limit level ・An environmentally friendly tool that quickly removes impurity deposits on workpieces and also manages waste liquid safely. ・Adoption of cleaning solution and cleaning method that replaces RCA cleaning solution ・Equipped with a spin cleaning unit that uses functional water ・High-speed diffusion of cleaning liquid onto the cleaning surface ・Watermark-less drying Adoption of cleaning solution and cleaning method that replaces RCA cleaning solution

■SPM → Ozonated water

・Complete room temperature cleaning (no high temperature process required) ・Reduced amount of chemical solution remaining on the mask ・Safety of waste liquid treatment (ISO14000 measures)

■Ammonia-added hydrogen water

Etching prevention for MoSi halftone mask

■Applications

・Product cleaning at photomask/reticle/mask blank manufacturers ・Reticle cleaning before exposure for semiconductor device manufacturers ・Product cleaning at semiconductor device manufacturer's in-house mask line (mask shop)

■Delivery record

・Domestic and international mask blanks/photomask/reticle manufacturers ・Domestic and foreign device manufacturers

  • Product

    Semiconductor manufacturing equipment Compatible with high-definition photomasks Photomask cleaning equipment Spin type cleaning equipment WULF series

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1 Models of Semiconductor manufacturing equipment Compatible with high-definition photomasks Photomask cleaning equipment Spin type cleaning equipment WULF series

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Semiconductor manufacturing equipment Compatible with high-definition photomasks Photomask cleaning equipment Spin type cleaning equipment WULF series-Part Number-WULF series

WULF series

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About Company Handling This Product

M.WATANABE & CO.,LTD.

Company Overview

M.Watanabe Co., Ltd., founded in 1953 with headquarters in Koga City, Japan, is a manufacturer of semiconducto...

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Cleaning Systems　M.WATANABE & CO.,LTD.
M.WATANABE & CO.,LTD.

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