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100.0%
Response Time
60.5hours
Product
Semiconductor manufacturing equipment Low-temperature film deposition Compatible with flexible substrates Glass substrate film deposition equipmentHandling Company
M.WATANABE & CO.,LTD.Categories
Image | Part Number | Price (excluding tax) | Device size (mm) | Film forming temperature | Gas type |
---|---|---|---|---|---|
Glass substrate film deposition equipment |
Available upon quote |
1,300 (W) x 7350 (D) x 2,000 (H) |
150~300℃ |
SiH4, O3/O2, PH3, B2H6 |
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Reviews shown here are reviews of companies.