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  4. Semiconductor manufacturing equipment Atmospheric pressure CVD (APCVD) equipment for small-scale production and development (D501) (M.WATANABE & CO.,LTD.)
Semiconductor manufacturing equipment Atmospheric pressure CVD (APCVD) equipment for small-scale production and development (D501)-D501
Semiconductor manufacturing equipment Atmospheric pressure CVD (APCVD) equipment for small-scale production and development (D501)-M.WATANABE & CO.,LTD.

Semiconductor manufacturing equipment Atmospheric pressure CVD (APCVD) equipment for small-scale production and development (D501)
M.WATANABE & CO.,LTD.

M.WATANABE & CO.,LTD.'s Response Status

Response Rate

100.0%

Response Time

52.4hours

About This Product

Batch type (simultaneous processing of multiple sheets) APCVD equipment for NSG (SiO2) /BSG/PSG/BPSG film formation for prototyping, development, and small lot production D501 is a batch-type (simultaneous processing of multiple substrates) atmospheric pressure CVD equipment (APCVD equipment) for the purpose of small-volume production/testing and the formation of silicon oxide films (SiO2 films) on irregularly shaped substrates.

■Basic information

Multiple wafers are manually loaded into a large tray, and the tray moves back and forth under the dispersion head (gas nozzle) to form a film. It maintains the characteristics of atmospheric pressure CVD (APCVD) and can be easily deposited.

■Features

・Simultaneous processing of irregularly shaped and sized substrates ・High deposition rate ・Simple maintenance ・Save footprint ・Low CoO (low running cost)

■Gas type

・SiH4/O2 type (SiH4/PH3/B2H6/O2/N2) ・TEOS/O3 series (TEOS/TMOP/TEB/O3/O2/N2) (optional) ・SiH4/O3 type (SiH4/PH3/B2H6/O3/O2/N2) (optional)

■Applications

・Interlayer insulation film (NSG/PSG/BPSG) ・Hard mask for diffusion/implantation, sacrificial film (NSG) ・Passivation film (protective film/insulating film) (NSG) ・Solid phase diffusion source film (BSG, PSG)/cap film (NSG) for solar cells

■Delivery record

・Domestic and international semiconductor device/opto device manufacturers ・University/Research Institute

  • Product

    Semiconductor manufacturing equipment Atmospheric pressure CVD (APCVD) equipment for small-scale production and development (D501)

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1 Models of Semiconductor manufacturing equipment Atmospheric pressure CVD (APCVD) equipment for small-scale production and development (D501)

Image Part Number Price (excluding tax) Device size (mm) Film forming temperature
Semiconductor manufacturing equipment Atmospheric pressure CVD (APCVD) equipment for small-scale production and development (D501)-Part Number-D501

D501

Available upon quote

1,200 (W) x 2,480 (D) x 1,940 (H)

350~430℃ (SiH4/O3 system 150~300℃)

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About Company Handling This Product

M.WATANABE & CO.,LTD.

Response Rate

100.0%

Response Time

52.4hrs

Company Overview

M.Watanabe Co., Ltd., founded in 1953 with headquarters in Koga City, Japan, is a manufacturer of semiconducto...

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  • Japan

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