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  4. Semiconductor manufacturing equipment High productivity continuous atmospheric pressure CVD (APCVD) equipment (AMAX1200) (M.WATANABE & CO.,LTD.)
Semiconductor manufacturing equipment High productivity continuous atmospheric pressure CVD (APCVD) equipment (AMAX1200)-AMAX1200
Semiconductor manufacturing equipment High productivity continuous atmospheric pressure CVD (APCVD) equipment (AMAX1200)-M.WATANABE & CO.,LTD.

Semiconductor manufacturing equipment High productivity continuous atmospheric pressure CVD (APCVD) equipment (AMAX1200)
M.WATANABE & CO.,LTD.

M.WATANABE & CO.,LTD.'s Response Status

Response Rate

100.0%

Response Time

60.5hours

About This Product

High productivity continuous atmospheric pressure CVD (APCVD) equipment for NSG (SiO2) /PSG/BPSG film formation for mass production (compatible with 12-inch wafers) The "AMAX" series is a continuous atmospheric pressure CVD system (APCVD) for the purpose of forming silicon oxide films (SiO2 films) such as interlayer insulation films, passivation films (protective films), and back seals for epitaxial wafers. equipment).

■Basic information

High throughput (high productivity) was achieved by continuously transporting trays loaded with wafers and passing them under a dispersion head (gas nozzle) while heating them from the bottom to form a film. By using SiC as the tray material, we are able to minimize heavy metal contamination and achieve stable process performance over the long term. It is also easy to maintain, with an automatic tray replacement function that allows for easy tray replacement.

■Features

・High productivity of ~56 wafers/h (compatible wafer size: ~12 inches) ・No vacuum or plasma required (thermal CVD) ・Countermeasures against heavy metal contamination (metal contamination) by adopting SiC trays ・Simple maintenance ・Low CoO (low running cost)

■Applications

・Epitaxial wafer back seal (NSG) ・Passivation film (protective film/insulating film) (NSG)

■Delivery record

・Domestic and international wafer manufacturers ・Semiconductor device manufacturer ・AMAX series total: 180 or more

  • Product

    Semiconductor manufacturing equipment High productivity continuous atmospheric pressure CVD (APCVD) equipment (AMAX1200)

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1 Models of Semiconductor manufacturing equipment High productivity continuous atmospheric pressure CVD (APCVD) equipment (AMAX1200)

Image Part Number Price (excluding tax) Device size (mm) Film forming temperature Gas type
Semiconductor manufacturing equipment High productivity continuous atmospheric pressure CVD (APCVD) equipment (AMAX1200)-Part Number-AMAX1200

AMAX1200

Available upon quote

2,165 (W) x 4,788 (D) x 2,250 (H)

350~430℃

SiH4/O2 type (SiH4/PH3/B2H6/O2/N2)

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About Company Handling This Product

M.WATANABE & CO.,LTD.

Response Rate

100.0%

Response Time

60.5hrs

Company Overview

M.Watanabe Co., Ltd., founded in 1953 with headquarters in Koga City, Japan, is a manufacturer of semiconducto...

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  • Japan

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