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  4. High precision birefringence phase difference measuring device Exicor AT series (Tokyo Instruments, Inc)
High precision birefringence phase difference measuring device Exicor AT series-Exicor AT (high sensitivity model)
High precision birefringence phase difference measuring device Exicor AT series-Tokyo Instruments, Inc

High precision birefringence phase difference measuring device Exicor AT series
Tokyo Instruments, Inc

Tokyo Instruments, Inc's Response Status

Response Rate

100.0%

Response Time

36.5hours

About This Product

■Summary

The birefringence phase difference measuring device Exicor® is recognized worldwide in the semiconductor lithography equipment and liquid crystal display fields. Instantly measures distortion (= retardation) and principal axis orientation, which cannot be detected with general birefringence measurement equipment, such as photomask substrates where even the slightest distortion is tolerated, lens glass materials for exposure equipment, and glass substrates for LCDs. Of course, the retardation of polarizer elements such as retardation films can also be evaluated with high precision. Birefringence distribution is mapped using an XY stage, and the latest Scan In Motion™ technology enables high-density mapping measurements in a short time. The stage accommodates samples of various sizes. Measurement wavelengths can be selected from extreme ultraviolet to near infrared.

■Extremely low level birefringence measurement

Employing a photoelastic modulator (PEM), it is possible to measure phase difference distribution with extremely low retardation of 1 nm or less. Detects even the slightest distortion. In addition, a new type of lock-in amplifier newly developed by HINDS enables high-speed measurement that far exceeds that of previous models. Achieved retardation resolution of 0.001nm and measurement time <10ms.

■Device selection according to the application

We propose a mapping stage size that matches the sample size. In addition to the standard HeNe laser, it also supports multi-wavelength measurements using LED light sources and xenon lamps, as well as measurements at wavelengths of 193 and 248 nm using an LDLS light source. In addition, it is also possible to construct custom-made systems such as oblique incidence measurement and reflection measurement.

■High-speed mapping measurement Scan In Motion™

Conventional mapping measurements are step-scan measurements that repeat stage movement and measurement. Therefore, as the number of measurement points increases, the measurement time becomes longer. Exicor's "Scan In Motion (SIM™)" performs measurements while moving the stage. The SIM function achieves a maximum of 100 points/second while minimizing deterioration in measurement accuracy, making it possible to perform high spatial resolution mapping measurements with low birefringence, which was previously difficult.

■Features

・Retardation noise level: 0.015 nm or less ・Lineup of measurement wavelengths from DUV to NIR ・Various stages depending on sample size ・High-speed mapping option that achieves the fastest speed of 100 points/second ・There is an oblique incidence measurement device compatible with spherical lenses, etc.

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    High precision birefringence phase difference measuring device Exicor AT series

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1 Models of High precision birefringence phase difference measuring device Exicor AT series

Image Part Number Price (excluding tax) Leading axis repeatability Fast axis resolution Measurement time Measurement spot diameter Wavelength Light source Phase difference repeatability Phase difference measurement range Phase difference resolution Added Scan In Motion
High precision birefringence phase difference measuring device Exicor AT series-Part Number-Exicor AT (high sensitivity model)

Exicor AT (high sensitivity model)

Available upon quote

±0.05 degrees @5nm

0.01 degree

<1 second/point

1mm

632.8nm

HeNe laser

±0.008nm

0~120nm or more

0.001nm

Fastest 100 points/second

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About Company Handling This Product

Tokyo Instruments, Inc

Response Rate

100.0%

Response Time

36.5hrs

Company Overview

Tokyo Instruments, Inc., established in 1981, and headquartered in Tokyo, Japan, is a manufacturer of opto-ele...

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