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Thermoplastic mr-I 7000E for thermal nanoimprint lithography
OSTECH Co., Ltd.

⚙️ Plastic & Rubber Manufacturing

About This Product

■Materials for nanoimprint lithography Polymers for thermal and UV-based nanoimprint lithography

・Thermoplastic plastic ・Curing polymer (thermosetting) ・UV curing polymer

■Characteristics of nanoimprint polymer

・Excellent film quality ・Coating of various base materials (e.g. Si, SiO2, AI) ・Achievable with minimum feature size of at least 50nm (depends on mold resolution) ・Advanced pattern transfer fidelity ・Safe solvent

■For pattern transfer

・Excellent imprint properties (short cycle time due to high speed polymer flow, low imprint pressure, low residual layer thickness) - High plasma etch resistance comparable to novolak-based photoresists

■Applications

・Etch mask for pattern transfer process ・Generation of nanopatterns for: mass data storage, nanophotonic devices, subwavelength optical elements, photonic crystals, microdisplays, LEDs

  • Product

    Thermoplastic mr-I 7000E for thermal nanoimprint lithography
  • Usage Scenarios

    Plastic & Rubber Manufacturing

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1 Models of Thermoplastic mr-I 7000E for thermal nanoimprint lithography

Image Part Number Price (excluding tax) Excipient Glass transition temperature Tg Imprint temperature Imprint pressure

Mr-I 7000E

Available upon quote

Ma-T 1050

60℃

125 - 150℃

20 - 50 bar

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