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  4. Negative photoresist for UV ma-N400 (OSTECH Co., Ltd.)

Negative photoresist for UV ma-N400
OSTECH Co., Ltd.

About This Product

■Characteristics of negative photoresist

Various negative photoresist series designed for various applications ・ Conventional pattern transfer ・Lift-off process ・Used as a permanent material ・Ready-to-use solutions for various viscosities

■Main uses

・Microelectronic technology and microsystem technology ・Mask for lift-off process ・Etch mask for semiconductors and metals

  • Product

    Negative photoresist for UV ma-N400

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1 Models of Negative photoresist for UV ma-N400

Image Part Number Price (excluding tax) Developer Thermal stability Irradiation dose @ 365 nm Spectral sensitivity

Ma-N400

Available upon quote

Ma-D 332/S and ma-D 331/S (NaOH-based)

Up to 110℃ for metal vapor deposition

350 - 1,900 mJ/cm2

300 - 380n

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About Company Handling This Product

OSTECH Co., Ltd.

  • Japan

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