High purity AlN dummy wafer
OSTECH Co., Ltd.


About This Product

■Features ・It has a coefficient of thermal expansion that matches that of Si, and is resistant to thermal shock and can withstand rapid heating and cooling. - No auxiliary agents required, minimizing metal contamination and particle generation. ・Excellent plasma resistance and fluorine gas corrosion resistance. ・A wafer with high thermal conductivity and thermal emissivity, and high thermal uniformity. ■Applications ・Dummy wafer for LP-CVD process ・Dummy wafer for high temperature diffusion process ・Various heat-resistant and chemical-resistant dummy wafers ・Dummy wafer for etching process

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    High purity AlN dummy wafer

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1 Models of High purity AlN dummy wafer

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High purity AlN dummy wafer

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