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  1. Metoree
  2. Semiconductor Manufacturing
  3. Photoacid Generators
  4. Photolithography materials Resist remover
  5. N-327
Photolithography materials Resist remover-Nagase ChemteX Co., Ltd.

N-327 | Photolithography materials Resist remover
Nagase ChemteX Co., Ltd.

Price (excluding tax)

Estimate Required

Nagase ChemteX Co., Ltd.'s Response Status

Response Rate

100.0%

Response Time

92.9hours

Model Filter

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AL corrosive

Laws and regulations Fire service law

Liquid

Operating conditions ℃/min

Peeling performance Positive removal

Peeling performance Residue removal

Purpose

Regulations PRTR

Rinse liquid

Viscosity mPa･s (25℃)

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  • Part Number

    N-327

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Photolithography materials Resist remover N-327's performance table

Image Price (excluding tax) AL corrosive Laws and regulations Fire service law Liquid Operating conditions ℃/min Peeling performance Positive removal Peeling performance Residue removal Purpose Regulations PRTR Rinse liquid Viscosity mPa･s (25℃)
Photolithography materials Resist remover-Part Number-N-327 Available upon quote ◎ Not applicable Water system Normal temperature~50/1~5 ○ ○ FPD Not applicable Water 8

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About Company Handling This Product

Nagase ChemteX Co., Ltd.

Response Rate

100.0%

Response Time

92.9hrs

  • Japan

Category of this product

Photoacid Generators

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