Oxford Instruments Ltd.'s Etching Equipment

■Summary The PlasmaPro 100 ALE atomic layer etch system enables precise control of etching of next generation semiconductor devices. Specifically d...

• Machining / Machine Tools

• Etching Equipment

■Summary The PlasmaPro 100 Cobra ICP RIE system uses high-density inductively coupled plasma to achieve fast etch rates. This process module suppor...

• Machining / Machine Tools

• Etching Equipment

The PlasmaPro 100 Estrelas platform is designed for total flexibility for deep reactive ion etching (DRIE) applications. We can meet the diverse pr...

• Machining / Machine Tools

• Etching Equipment

PlasmaPro 100 Polaris is a single-wafer etch system that provides a smart solution with the etch performance you need to stay competitive. Designed...

• Machining / Machine Tools

• Etching Equipment

The PlasmaPro 100 RIE module provides isotropic and anisotropic dry etching for a wide range of processes. Suitable for research and manufacturing ...

• Machining / Machine Tools

• Etching Equipment

■Summary The PlasmaPro 80 ICP RIE is a system that provides a versatile ICP etch solution with a compact, small footprint and convenient open loadi...

• Machining / Machine Tools

• Etching Equipment

The PlasmaPro 80 is a compact, space-saving system that provides versatile etch and deposition solutions in an easy-to-use, open-load format. This ...

• Machining / Machine Tools

• Etching Equipment

■Summary PlasmaPro 80 Reactive Ion Etching (RIE) is a compact, space-saving system that provides a variety of etch and deposition solutions with an...

• Machining / Machine Tools

• Etching Equipment