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Oxford Instruments Ltd.'s Plasma Etching Systems

Oxford Instruments Ltd.

10 products found

Achieves smooth surfaces with low damage PlasmaPro 100 ALE Atomic Layer Etching System-Oxford Instruments Ltd.

Oxford Instruments Ltd.

Achieves smooth surfaces with low damage PlasmaPro 100 ALE Atomic Layer Etching System

290+ people viewing

Standard Response

5.0 Company Review

Response Rate
100.0 %
Response Time
24.8 hours

■Summary The PlasmaPro 100 ALE atomic layer etch system enables precise control of etching of next generation semiconductor devices. Specifically d...


Achieving high-speed etching rates PlasmaPro 100 Cobra ICP RIE etching system-Oxford Instruments Ltd.

Oxford Instruments Ltd.

Achieving high-speed etching rates PlasmaPro 100 Cobra ICP RIE etching system

450+ people viewing

Last viewed: 6 hours ago

Standard Response

5.0 Company Review

Response Rate
100.0 %
Response Time
24.8 hours

■Summary The PlasmaPro 100 Cobra ICP RIE system uses high-density inductively coupled plasma to achieve fast etch rates. This process module suppor...


Platform for DRIE applications PlasmaPro 100 Estrelas DRIE-Oxford Instruments Ltd.

Oxford Instruments Ltd.

Platform for DRIE applications PlasmaPro 100 Estrelas DRIE

320+ people viewing

Last viewed: 11 hours ago

Standard Response

5.0 Company Review

Response Rate
100.0 %
Response Time
24.8 hours

The PlasmaPro 100 Estrelas platform is designed for total flexibility for deep reactive ion etching (DRIE) applications. We can meet the diverse pr...


Single wafer ICP RIE etching system PlasmaPro 100 Polaris ICP RIE-Oxford Instruments Ltd.

Oxford Instruments Ltd.

Single wafer ICP RIE etching system PlasmaPro 100 Polaris ICP RIE

280+ people viewing

Standard Response

5.0 Company Review

Response Rate
100.0 %
Response Time
24.8 hours

PlasmaPro 100 Polaris is a single-wafer etch system that provides a smart solution with the etch performance you need to stay competitive. Designed...


Isotropic and anisotropic dry etching PlasmaPro 100 RIE compatible with a wide range of processes-Oxford Instruments Ltd.

Oxford Instruments Ltd.

Isotropic and anisotropic dry etching PlasmaPro 100 RIE compatible with a wide range of processes

280+ people viewing

Last viewed: 9 hours ago

Standard Response

5.0 Company Review

Response Rate
100.0 %
Response Time
24.8 hours

The PlasmaPro 100 RIE module provides isotropic and anisotropic dry etching for a wide range of processes. Suitable for research and manufacturing ...


Convenient open loading provides a versatile ICP etch solution PlasmaPro 80 ICP RIE-Oxford Instruments Ltd.

Oxford Instruments Ltd.

Convenient open loading provides a versatile ICP etch solution PlasmaPro 80 ICP RIE

280+ people viewing

Standard Response

5.0 Company Review

Response Rate
100.0 %
Response Time
24.8 hours

■Summary The PlasmaPro 80 ICP RIE is a system that provides a versatile ICP etch solution with a compact, small footprint and convenient open loadi...


Compact and versatile etch and deposition solution PlasmaPro 80 PECVD-Oxford Instruments Ltd.

Oxford Instruments Ltd.

Compact and versatile etch and deposition solution PlasmaPro 80 PECVD

310+ people viewing

Last viewed: 1 day ago

Standard Response

5.0 Company Review

Response Rate
100.0 %
Response Time
24.8 hours

The PlasmaPro 80 is a compact, space-saving system that provides versatile etch and deposition solutions in an easy-to-use, open-load format. This ...


PlasmaPro 80 RIE provides versatile etch and deposition solutions with an easy-to-use atmospheric charging method-Oxford Instruments Ltd.

Oxford Instruments Ltd.

PlasmaPro 80 RIE provides versatile etch and deposition solutions with an easy-to-use atmospheric charging method

290+ people viewing

Last viewed: 11 hours ago

Standard Response

5.0 Company Review

Response Rate
100.0 %
Response Time
24.8 hours

■Summary PlasmaPro 80 Reactive Ion Etching (RIE) is a compact, space-saving system that provides a variety of etch and deposition solutions with an...


A flexible solution for plasma-enhanced chemical vapor deposition processes PlasmaPro 800 PECVD-Oxford Instruments Ltd.

Oxford Instruments Ltd.

A flexible solution for plasma-enhanced chemical vapor deposition processes PlasmaPro 800 PECVD

320+ people viewing

Last viewed: 16 hours ago

Standard Response

5.0 Company Review

Response Rate
100.0 %
Response Time
24.8 hours

The PlasmaPro 800 provides a flexible solution for plasma-enhanced chemical vapor deposition (PECVD) processes for large wafer batches and 300mm wa...


A flexible solution for RIE processes in a compact footprint and open load system PlasmaPro 800 RIE-Oxford Instruments Ltd.

Oxford Instruments Ltd.

A flexible solution for RIE processes in a compact footprint and open load system PlasmaPro 800 RIE

250+ people viewing

Last viewed: 16 hours ago

Standard Response

5.0 Company Review

Response Rate
100.0 %
Response Time
24.8 hours

■Summary The PlasmaPro 800 RIE provides a flexible solution for reactive ion etching (RIE) processes for large wafer batches and 300mm wafers in a ...



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