10 products found
Oxford Instruments Ltd.
210+ people viewing
Last viewed: 17 hours ago
very fast response<
100.0% Response Rate
0.2hours Response Time
■Summary The PlasmaPro 100 ALE atomic layer etch system enables precise control of etching of next generation semiconductor devices. Specifically d...
Oxford Instruments Ltd.
330+ people viewing
Last viewed: 13 minutes ago
very fast response<
100.0% Response Rate
0.2hours Response Time
■Summary The PlasmaPro 100 Cobra ICP RIE system uses high-density inductively coupled plasma to achieve fast etch rates. This process module suppor...
Oxford Instruments Ltd.
220+ people viewing
Last viewed: 17 hours ago
very fast response<
100.0% Response Rate
0.2hours Response Time
The PlasmaPro 100 Estrelas platform is designed for total flexibility for deep reactive ion etching (DRIE) applications. We can meet the diverse pr...
Oxford Instruments Ltd.
170+ people viewing
Last viewed: 7 hours ago
very fast response<
100.0% Response Rate
0.2hours Response Time
PlasmaPro 100 Polaris is a single-wafer etch system that provides a smart solution with the etch performance you need to stay competitive. Designed...
Oxford Instruments Ltd.
170+ people viewing
Last viewed: 5 hours ago
very fast response<
100.0% Response Rate
0.2hours Response Time
The PlasmaPro 100 RIE module provides isotropic and anisotropic dry etching for a wide range of processes. Suitable for research and manufacturing ...
Oxford Instruments Ltd.
190+ people viewing
Last viewed: 17 hours ago
very fast response<
100.0% Response Rate
0.2hours Response Time
■Summary The PlasmaPro 80 ICP RIE is a system that provides a versatile ICP etch solution with a compact, small footprint and convenient open loadi...
Oxford Instruments Ltd.
200+ people viewing
Last viewed: 5 hours ago
very fast response<
100.0% Response Rate
0.2hours Response Time
The PlasmaPro 80 is a compact, space-saving system that provides versatile etch and deposition solutions in an easy-to-use, open-load format. This ...
Oxford Instruments Ltd.
200+ people viewing
Last viewed: 17 hours ago
very fast response<
100.0% Response Rate
0.2hours Response Time
■Summary PlasmaPro 80 Reactive Ion Etching (RIE) is a compact, space-saving system that provides a variety of etch and deposition solutions with an...
Oxford Instruments Ltd.
200+ people viewing
Last viewed: 18 hours ago
very fast response<
100.0% Response Rate
0.2hours Response Time
The PlasmaPro 800 provides a flexible solution for plasma-enhanced chemical vapor deposition (PECVD) processes for large wafer batches and 300mm wa...
Oxford Instruments Ltd.
160+ people viewing
Last viewed: 8 hours ago
very fast response<
100.0% Response Rate
0.2hours Response Time
■Summary The PlasmaPro 800 RIE provides a flexible solution for reactive ion etching (RIE) processes for large wafer batches and 300mm wafers in a ...