Oxford Instruments Ltd.'s Plasma Etching Systems

Oxford Instruments Ltd.

10 products found

Oxford Instruments Ltd.

Achieves smooth surfaces with low damage PlasmaPro 100 ALE Atomic Layer Etching System

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Last viewed: 17 hours ago

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■Summary The PlasmaPro 100 ALE atomic layer etch system enables precise control of etching of next generation semiconductor devices. Specifically d...

Oxford Instruments Ltd.

Achieving high-speed etching rates PlasmaPro 100 Cobra ICP RIE etching system

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Last viewed: 13 minutes ago

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100.0% Response Rate

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■Summary The PlasmaPro 100 Cobra ICP RIE system uses high-density inductively coupled plasma to achieve fast etch rates. This process module suppor...

Oxford Instruments Ltd.

Platform for DRIE applications PlasmaPro 100 Estrelas DRIE

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The PlasmaPro 100 Estrelas platform is designed for total flexibility for deep reactive ion etching (DRIE) applications. We can meet the diverse pr...

Oxford Instruments Ltd.

Single wafer ICP RIE etching system PlasmaPro 100 Polaris ICP RIE

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Last viewed: 7 hours ago

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100.0% Response Rate

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PlasmaPro 100 Polaris is a single-wafer etch system that provides a smart solution with the etch performance you need to stay competitive. Designed...

Oxford Instruments Ltd.

Isotropic and anisotropic dry etching PlasmaPro 100 RIE compatible with a wide range of processes

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Last viewed: 5 hours ago

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100.0% Response Rate

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The PlasmaPro 100 RIE module provides isotropic and anisotropic dry etching for a wide range of processes. Suitable for research and manufacturing ...

Oxford Instruments Ltd.

Convenient open loading provides a versatile ICP etch solution PlasmaPro 80 ICP RIE

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Last viewed: 17 hours ago

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100.0% Response Rate

0.2hours Response Time

■Summary The PlasmaPro 80 ICP RIE is a system that provides a versatile ICP etch solution with a compact, small footprint and convenient open loadi...

Oxford Instruments Ltd.

Compact and versatile etch and deposition solution PlasmaPro 80 PECVD

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Last viewed: 5 hours ago

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100.0% Response Rate

0.2hours Response Time

The PlasmaPro 80 is a compact, space-saving system that provides versatile etch and deposition solutions in an easy-to-use, open-load format. This ...

Oxford Instruments Ltd.

PlasmaPro 80 RIE provides versatile etch and deposition solutions with an easy-to-use atmospheric charging method

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Last viewed: 17 hours ago

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100.0% Response Rate

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■Summary PlasmaPro 80 Reactive Ion Etching (RIE) is a compact, space-saving system that provides a variety of etch and deposition solutions with an...

Oxford Instruments Ltd.

A flexible solution for plasma-enhanced chemical vapor deposition processes PlasmaPro 800 PECVD

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Last viewed: 18 hours ago

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100.0% Response Rate

0.2hours Response Time

The PlasmaPro 800 provides a flexible solution for plasma-enhanced chemical vapor deposition (PECVD) processes for large wafer batches and 300mm wa...

Oxford Instruments Ltd.

A flexible solution for RIE processes in a compact footprint and open load system PlasmaPro 800 RIE

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Last viewed: 8 hours ago

very fast response<

100.0% Response Rate

0.2hours Response Time

■Summary The PlasmaPro 800 RIE provides a flexible solution for reactive ion etching (RIE) processes for large wafer batches and 300mm wafers in a ...


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