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10 products found
Oxford Instruments Ltd.
320+ people viewing
Last viewed: 3 hours ago
■Summary The PlasmaPro 100 ALE atomic layer etch system enables precise control of etching of next generation semiconductor devices. Specifically d...
Oxford Instruments Ltd.
490+ people viewing
Last viewed: 13 hours ago
■Summary The PlasmaPro 100 Cobra ICP RIE system uses high-density inductively coupled plasma to achieve fast etch rates. This process module suppor...
Oxford Instruments Ltd.
350+ people viewing
Last viewed: 7 hours ago
The PlasmaPro 100 Estrelas platform is designed for total flexibility for deep reactive ion etching (DRIE) applications. We can meet the diverse pr...
Oxford Instruments Ltd.
310+ people viewing
Last viewed: 12 hours ago
PlasmaPro 100 Polaris is a single-wafer etch system that provides a smart solution with the etch performance you need to stay competitive. Designed...
Oxford Instruments Ltd.
290+ people viewing
Last viewed: 23 hours ago
The PlasmaPro 100 RIE module provides isotropic and anisotropic dry etching for a wide range of processes. Suitable for research and manufacturing ...
Oxford Instruments Ltd.
300+ people viewing
■Summary The PlasmaPro 80 ICP RIE is a system that provides a versatile ICP etch solution with a compact, small footprint and convenient open loadi...
Oxford Instruments Ltd.
340+ people viewing
Last viewed: 1 day ago
The PlasmaPro 80 is a compact, space-saving system that provides versatile etch and deposition solutions in an easy-to-use, open-load format. This ...
Oxford Instruments Ltd.
320+ people viewing
Last viewed: 1 day ago
■Summary PlasmaPro 80 Reactive Ion Etching (RIE) is a compact, space-saving system that provides a variety of etch and deposition solutions with an...
Oxford Instruments Ltd.
350+ people viewing
Last viewed: 10 hours ago
The PlasmaPro 800 provides a flexible solution for plasma-enhanced chemical vapor deposition (PECVD) processes for large wafer batches and 300mm wa...
Oxford Instruments Ltd.
270+ people viewing
Last viewed: 5 hours ago
■Summary The PlasmaPro 800 RIE provides a flexible solution for reactive ion etching (RIE) processes for large wafer batches and 300mm wafers in a ...
