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Oxford Instruments Ltd.'s Plasma Etching Systems

Oxford Instruments Ltd.

5 products found

Achieves smooth surfaces with low damage PlasmaPro 100 ALE Atomic Layer Etching System-Oxford Instruments Ltd.

Oxford Instruments Ltd.

Achieves smooth surfaces with low damage PlasmaPro 100 ALE Atomic Layer Etching System

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Last viewed: 6 hours ago

■Summary The PlasmaPro 100 ALE atomic layer etch system enables precise control of etching of next generation semiconductor devices. Specifically d...


Achieving high-speed etching rates PlasmaPro 100 Cobra ICP RIE etching system-Oxford Instruments Ltd.

Oxford Instruments Ltd.

Achieving high-speed etching rates PlasmaPro 100 Cobra ICP RIE etching system

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Last viewed: 9 hours ago

■Summary The PlasmaPro 100 Cobra ICP RIE system uses high-density inductively coupled plasma to achieve fast etch rates. This process module suppor...


Platform for DRIE applications PlasmaPro 100 Estrelas DRIE-Oxford Instruments Ltd.

Oxford Instruments Ltd.

Platform for DRIE applications PlasmaPro 100 Estrelas DRIE

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Last viewed: 9 hours ago

The PlasmaPro 100 Estrelas platform is designed for total flexibility for deep reactive ion etching (DRIE) applications. We can meet the diverse pr...


Single wafer ICP RIE etching system PlasmaPro 100 Polaris ICP RIE-Oxford Instruments Ltd.

Oxford Instruments Ltd.

Single wafer ICP RIE etching system PlasmaPro 100 Polaris ICP RIE

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Last viewed: 10 minutes ago

PlasmaPro 100 Polaris is a single-wafer etch system that provides a smart solution with the etch performance you need to stay competitive. Designed...


Isotropic and anisotropic dry etching PlasmaPro 100 RIE compatible with a wide range of processes-Oxford Instruments Ltd.

Oxford Instruments Ltd.

Isotropic and anisotropic dry etching PlasmaPro 100 RIE compatible with a wide range of processes

530+ people viewing

Last viewed: 9 hours ago

The PlasmaPro 100 RIE module provides isotropic and anisotropic dry etching for a wide range of processes. Suitable for research and manufacturing ...



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