6 registered Plasma Processing Equipment of Denshi Giken Co., Ltd.
Denshi Giken Co., Ltd.
■Summary This is a low-cost batch processing plasma processing equipment. Because it is an isotropic plasma, samples can be processed from all dire...
Denshi Giken Co., Ltd.
■Summary This is a plasma surface modification device that specializes in uniform omnidirectional processing of powder materials. This device is eq...
Denshi Giken Co., Ltd.
■Summary This is a plasma device that can precisely process substrate surfaces with anisotropy using reactive ion etching (RIE) plasma. We can perf...
Denshi Giken Co., Ltd.
■Summary We have developed a plasma processing device that can batch process glass substrates, printed circuit boards, etc. by installing multiple ...
Denshi Giken Co., Ltd.
■Summary The activated gas is generated by flowing argon gas (Ar) and oxygen gas (O₂) into a reaction tube (made of quartz glass) under atmospheric...
Denshi Giken Co., Ltd.
■Summary No vacuum chamber or vacuum pump required. This is a plasma irradiation unit that allows you to easily evaluate plasma surface modificatio...