Data Loggers
Conveyor Systems
ALD Systems
Plasma-Enhanced CVD
Plasma Cleaners
Plasma Cleaning Systems
Atmospheric pressure plasma device
Plasma Etching Systems
Coating Equipment
PVDF
Coating Machines
FPD Manufacturing Equipment
Powder Dispensers
SAKIGAKE-Semiconductor
650+ people viewing
Last viewed: 20 hours ago
■ Product overview ・ Easy to handle with pentab ・ No gas supply is required, it can be used only with AC100V power connection ・...
SAKIGAKE-Semiconductor
430+ people viewing
Last viewed: 1 day ago
It is a compact and inexpensive specification. Surface treatment treatment before the formation of thin film formation before c...
SAKIGAKE-Semiconductor
430+ people viewing
Last viewed: 18 hours ago
A vacuum plasma device that can introduce various gases. Gas flow adjustment, power adjustment, and vacuum monitor You can set ...
SAKIGAKE-Semiconductor
420+ people viewing
Last viewed: 1 day ago
The industry's first safe plasma CVD that directly forms a film from a liquid raw material. ■ Product overview ・ Thin film for...
SAKIGAKE-Semiconductor
410+ people viewing
Last viewed: 16 hours ago
■ Product overview ・ Easy to handle with handy type ・ The control box is a tabletop type space saving ・ Moderion depending on t...
SAKIGAKE-Semiconductor
410+ people viewing
■ Characteristics of products ・ The set of line from the roll -out to the wrapping is the manufacturing processing department. ...
SAKIGAKE-Semiconductor
400+ people viewing
Last viewed: 1 day ago
For surface modification and cleaning of boards, fiber, and film -shaped objects. For bonding, printing, and coating preprocess...
SAKIGAKE-Semiconductor
390+ people viewing
Last viewed: 18 hours ago
■ Characteristics of products ・ A coating method that forms a thin film by immersing the base material in the liquid and pulled...
SAKIGAKE-Semiconductor
380+ people viewing
Last viewed: 14 hours ago
Up to 80 plasma processing is possible with a maximum of 500ml bottles at a time. By replacing the electrode, it supports bottl...
SAKIGAKE-Semiconductor
380+ people viewing
Last viewed: 1 day ago
■ Characteristics of products ・ Easy operation from the PC. ・ High -precision powder supply by stepping motor drive. ・ By linki...
SAKIGAKE-Semiconductor
380+ people viewing
Last viewed: 20 hours ago
Mix with liquid by surface treatment of powder without a surfactant. Preparation: Filer preprocessing, baked powder pretreatmen...
SAKIGAKE-Semiconductor
370+ people viewing
Ideal for processing powder and chip capacitors. A rotating mechanism has been added to the vacuum plasma so that the entire su...
SAKIGAKE-Semiconductor
370+ people viewing
Last viewed: 1 day ago
High -speed and high efficiency by heating SIO2 and SI etching and organic products. ■ Product overview ・ Newly heated stage h...
SAKIGAKE-Semiconductor
370+ people viewing
Last viewed: 21 hours ago
■ Characteristics of products ・ Supply is a touch panel control, easy to use interface ・ Continuous processing combined with th...
SAKIGAKE-Semiconductor
360+ people viewing
Last viewed: 51 minutes ago
Hyperataking on the surface of Teflon and water repellency of non -woven fabric. ■ Use ・ PTFE (Teflon) Hydrylore (NH3 required...
2 models listed
SAKIGAKE-Semiconductor
360+ people viewing
■ Product overview ・ Surface modification: In a atmospheric pressure environment, plasma without charge damage is generated sta...
SAKIGAKE-Semiconductor
360+ people viewing
Last viewed: 7 hours ago
■ Product overview ·Low price ・ Small size - Easy combination with other devices - Good handling by integrating the processing...
SAKIGAKE-Semiconductor
340+ people viewing
Last viewed: 7 hours ago
SIO2 and SI etching, etc. Made fine circuits such as semiconductor integration circuits. ■ Product overview ·compact ・ Easy op...
SAKIGAKE-Semiconductor
340+ people viewing
Last viewed: 54 minutes ago
Ptfe (Teflon) nytherization. Water -repellent treatment of various materials. Glass film formation. Such ■ Product overview ・ ...
SAKIGAKE-Semiconductor
330+ people viewing
Last viewed: 9 hours ago
Plasma processing is possible on the surface that is curved with a stainless steel wire brush. ■ Characteristics of products ・...
SAKIGAKE-Semiconductor
330+ people viewing
Last viewed: 7 hours ago
■ Product overview ・ Wash the inner wall of the tube in the air pressure environment and modify the surface ・ Continuous proces...
SAKIGAKE-Semiconductor
330+ people viewing
Last viewed: 4 hours ago
■ Product overview ・ No introduction gas required, surface modification is possible in air ・ Wide slit irradiation is possible ...
SAKIGAKE-Semiconductor
330+ people viewing
Last viewed: 8 hours ago
Attached plasma processing at lower temperature and lower flow at low flow. Surface modification: In a atmospheric pressure env...
SAKIGAKE-Semiconductor
320+ people viewing
Last viewed: 5 hours ago
■ Product overview ・ Improvement of diversification of powder by plasma in the liquid ・ We will improve production efficiency b...
SAKIGAKE-Semiconductor
310+ people viewing
Last viewed: 3 hours ago
Improved irradiation accuracy in combination with the atmospheric pressure plasma device. The program is freely with PC control...
SAKIGAKE-Semiconductor
310+ people viewing
■ Product overview ・ Multi -stage electrode mass processing ・ Change the electrode structure to support various containers ・ On...
SAKIGAKE-Semiconductor
300+ people viewing
Last viewed: 1 day ago
■ Product overview ・ Guide plasma with many flexible ultra -fine tubes to achieve complex shapes. ・ Continuous processing is po...
SAKIGAKE-Semiconductor
300+ people viewing
■ Characteristics of products ・ The set of line from the roll -out to the wrapping is the manufacturing processing department. ...
SAKIGAKE-Semiconductor
300+ people viewing
Air pressure (remote) dielectric barrier discharge device Slit type SKIP-SLIT (Technology of Dr. Sakai, Kyoto University) The ...
SAKIGAKE-Semiconductor
300+ people viewing
Attotive pressure (remote) dielectric barrier discharge device surface type SKIP-CBL300 (Technology of Kyoto University Dr. Sak...
Website | SAKIGAKE-Semiconductor Website |
---|