XCSW compounds / semiconductor crystals CZ method Siliconweha
Tours Co., Ltd.
About This Product
■ XCSW
XCSW is a compound semiconductor material company founded in Amoi, China in 1990. On the Ⅲ-al, in, as, p based on the Ⅲ-ⅴ tribe silicopop N-type semiconductor, the first generation GE wafer and the second generation gallium linery have been developed a substrate growth epitrical technology. Currently, MBE or MOCVD handles LED, SIC and GAN for power devices.
■ Characteristics
・ CZ method silicon, which can select a dope concentration, is used for IC chips, diodes, solar cell panels, etc. By dope of galium and germanium, it is also used as a high -efficiency, radioactivity and remedy -resistant solar cell material.
・ The SI wafer produced by the CZ development method can be used by either N type P type, and it is possible to provide low -resistance SI wafers by doping high concentration. The face direction <110> is noticed as a new generation SI wafer.
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Product
XCSW compounds / semiconductor crystals CZ method Siliconweha
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Handling Company
Tours Co., Ltd.
3 Models of XCSW compounds / semiconductor crystals CZ method Siliconweha
Items marked with have different values depending on the model number.
Click on the part number for more information about each product
| Product Image | Part Number | Price (excluding tax) | BOW | Back | Chipping | Conductive | Direction | LPD | Primary flat length | Primary flat oriented | Resistance value (Ω ・ cm) | Secondary flat direction | Secondary flat length | Surface finishing | TTV | Training method | Warp | diameter | thickness | φ diameter (inch) |
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CZ-Si |
Available upon quote | ≦ 40um | Etched | none | N or p | <100>, <110>, <111> | ≧ 0.3um at ≦ 15pcs | 57.5 ± 2.5mm | <001> ± 1 ° | > 1 ~ 300 | none | none | Chemical mechanical polishing | ≦ 5 um | Cz | ≦ 40um | 76.2 ~ 200mm | 160 or more | 3 ~ 8 |
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MCZ-SI |
Available upon quote | ≦ 40um | Etched | none | N or p | <100>, <110>, <111> | ≧ 0.3um at ≦ 15pcs | 57.5 ± 2.5mm | <001> ± 1 ° | > 1 ~ 300 | none | none | Chemical mechanical polishing | ≦ 5 um | Mcz | ≦ 40um | 76.2 ~ 200mm | 160 or more | 3 ~ 8 |
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High concentration CZ-Si |
Available upon quote | ≦ 40um | Etched | none | N or p | <100>, <110>, <111> | ≧ 0.3um at ≦ 15pcs | 57.5 ± 2.5mm | <001> ± 1 ° | > 0.001 ~ 1 | none | none | Chemical mechanical polishing | ≦ 5 um | High concentration CZ | ≦ 40um | 76.2 ~ 200mm | 160 or more | 3 ~ 8 |
Click on the part number for more information about each product
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About Company Handling This Product
- Japan
- Since 2016
- 2 employees