XCSW compound / semiconductor crystal FZ method Siliconweha
Tours Co., Ltd.
About This Product
■ XCSW
XCSW is a compound semiconductor material company founded in Amoi, China in 1990. On the Ⅲ-al, in, as, p based on the Ⅲ-ⅴ tribe silicopop N-type semiconductor, the first generation GE wafer and the second generation gallium linery have been developed a substrate growth epitrical technology. Currently, MBE or MOCVD handles LED, SIC and GAN for power devices.
■ Characteristics
・ Silicon grown in the FZ method is a single crystal structure that is close to a low defective density and a small foreign substance content.
・ We will provide various SI wafers that have adjusted the resistance and conductive type according to the use of FZ development method as sub -streams.
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Product
XCSW compound / semiconductor crystal FZ method Siliconweha
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Handling Company
Tours Co., Ltd.
3 Models of XCSW compound / semiconductor crystal FZ method Siliconweha
Items marked with have different values depending on the model number.
Click on the part number for more information about each product
| Product Image | Part Number | Price (excluding tax) | BOW | Back | Chipping | Conductive | Direction | LPD | Primary flat length | Primary flat oriented | Resistance value (Ω ・ cm) | Secondary flat direction | Secondary flat length | Surface finishing | TTV | Training method | Warp | diameter | thickness | φ diameter (inch) |
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FZ-Si |
Available upon quote | ≦ 40um | Etched | none | N or p | <100> or <111> | ≧ 0.3um at ≦ 15pcs | 57.5 ± 2.5mm | <001> ± 1 ° | > 1,000 | none | none | Chemical mechanical polishing | ≦ 5 um | Fz | ≦ 40um | 150 ± 0.5mm | 675 ± 15um | 3 ~ 8 |
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NTDFZ-SI |
Available upon quote | ≦ 40um | Etched | none | N | <100> or <111> | ≧ 0.3um at ≦ 15pcs | 57.5 ± 2.5mm | <001> ± 1 ° | 30-800 | none | none | Chemical mechanical polishing | ≦ 5 um | NTDFZ | ≦ 40um | 150 ± 0.5mm | 675 ± 15um | 3 ~ 8 |
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Gdfz-si |
Available upon quote | ≦ 40um | Etched | none | N or p | <100> or <111> | ≧ 0.3um at ≦ 15pcs | 57.5 ± 2.5mm | <001> ± 1 ° | 0.001 ~ 300 | none | none | Chemical mechanical polishing | ≦ 5 um | Gdfz | ≦ 40um | 150 ± 0.5mm | 675 ± 15um | 3 ~ 8 |
Click on the part number for more information about each product
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About Company Handling This Product
- Japan
- Since 2016
- 2 employees