XCSW compound / semiconductor crystal etching silicon wafer
Tours Co., Ltd.
About This Product
■ XCSW
XCSW is a compound semiconductor material company founded in Amoi, China in 1990. On the Ⅲ-al, in, as, p based on the Ⅲ-ⅴ tribe silicopop N-type semiconductor, the first generation GE wafer and the second generation gallium linery have been developed a substrate growth epitrical technology. Currently, MBE or MOCVD handles LED, SIC and GAN for power devices.
■ Characteristics
・ It is a siliconwehaha that characterizes good gloss and low cost while keeping the roughness low. It is used as a substitute for polishing wafer and epitaxial wafer to reduce the price. There are several etching wafers such as low roughness, low -reflective ratings, and high reflectivity.
-The etching wafer is a SI wafer with low cuteness, good surface gloss, and low cost. It is effective as a trial alternative to polishing wafer and epitaxial wafer, which uses electronic elements and parts during manufacturing.
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Product
XCSW compound / semiconductor crystal etching silicon wafer
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Handling Company
Tours Co., Ltd.
1 Models of XCSW compound / semiconductor crystal etching silicon wafer
| Product Image | Part Number | Price (excluding tax) |
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FZ-SI etching wafer |
Available upon quote |
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About Company Handling This Product
- Japan
- Since 2016
- 2 employees