Product
XCSW compounds / semiconductor crystal SI crystal substrates, silicon wafersHandling Company
Tours Co., Ltd.Items marked with have different values depending on the model number.
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Product Image | Part Number | Price (excluding tax) | Back | Crystal development method | Density | Direction | Dopant | Front | Parallelity | Particle (MAX) | Polishing surface | Primary flat | Radial ratio resistance change amount | Ratio resistance | Resistance value | Scratch, chips, peel, etc. | Substrate thickness | Wafer size | inch | particle | thickness |
---|---|---|---|---|---|---|---|---|---|---|---|---|---|---|---|---|---|---|---|---|---|
Test Wake Ha-N type 150mm SCL |
Available upon quote | Etched | (1-100) cz | <5,000/cm² | <100> ± 2 ° | Rin (P) | Mirror polishing |
Bow (Max): 60um TIR (MAX): 6um TAPER (Max): 12um Warp (Max): 60um |
≧ 0.3um, 30 | - |
Length: 57.5 ± 2.5mm Valcourgance: (110) ± 2 ° SEMI compliant Secondary flat: SEMI compliant |
15% | - | 4 ~ 7ohm.cm | none | - | 150 ± 0.5mm | - | - | 675 ± 25um | |
Monitor/Dummy SI Waeha |
Available upon quote | - | - | - |
4 inches: (100) or (111) 6-12 inches: -100 |
- | - | - | - |
4 ~ 8 inches: one side 12 inches: double -sided |
- | - | 0 ~ 100 | - | - | 250 ~ 775UM | - | 4-12 |
4 ~ 8 inches: 0.2um ≦ 30 pieces 12 inches: 0.09um ≦ 100 pieces |
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Click on the part number for more information about each product