XCSW compounds / semiconductor crystal SI crystal substrates, silicon wafers-Tours Co., Ltd.

Test Wake Ha-N type 150mm SCL | XCSW compounds / semiconductor crystal SI crystal substrates, silicon wafers
Tours Co., Ltd.


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Crystal development method

Density

Direction

Dopant

Front

Parallelity

Particle (MAX)

Primary flat

Radial ratio resistance change amount

Resistance value

Scratch, chips, peel, etc.

Wafer size

thickness

Polishing surface

Ratio resistance

Substrate thickness

inch

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  • Part Number

    Test Wake Ha-N type 150mm SCL




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XCSW compounds / semiconductor crystal SI crystal substrates, silicon wafers Test Wake Ha-N type 150mm SCL's performance table

Items marked with have different values ​​depending on the model number.

Product Image Price (excluding tax) Back Crystal development method Density Direction Dopant Front Parallelity Particle (MAX) Primary flat Radial ratio resistance change amount Resistance value Scratch, chips, peel, etc. Wafer size thickness
XCSW compounds / semiconductor crystal SI crystal substrates, silicon wafers-Part Number-Test Wake Ha-N type 150mm SCL Available upon quote Etched (1-100) cz <5,000/cm² <100> ± 2 ° Rin (P) Mirror polishing Bow (Max): 60um TIR (MAX): 6um TAPER (Max): 12um Warp (Max): 60um ≧ 0.3um, 30 Length: 57.5 ± 2.5mm Valcourgance: (110) ± 2 ° SEMI compliant Secondary flat: SEMI compliant 15% 4 ~ 7ohm.cm none 150 ± 0.5mm 675 ± 25um

There are 2 models for this product.

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About Company Handling This Product

Tours Co., Ltd.

  • Japan
  • Since 2016
  • 2 employees

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