Attotive pressure plasma device downstream type (Precise series)-Precise downstream type
Attotive pressure plasma device downstream type (Precise series)-E -Square Co., Ltd.

Attotive pressure plasma device downstream type (Precise series)
E -Square Co., Ltd.


About This Product

The product is the Precise series. It completely eliminates the processing damage and can be uniformly processed on the wide surface. The equipment price will vary depending on the plasma width of the device (from 200mm to 2950mm width), so please contact us. ■ Characteristics 1. Damage -free processing of functional grant on the wide work surface. 2. The desired contact angle can be controlled by the device. 3. The active species (radicals) penetrate the details of the work by the discharge pressure, and can be treated internally on the fiber bundle and the porous surface. 4. By changing the added gas, it can be used for sterilization and sterilization as a water repellent / redemption treatment and etching, and a high concentration ozon sauce. The ozone concentration can instantly generate a high concentration of 5000 ppm. A uniform processing from 5.200mm to 2950 mm is possible. 6. There is no physical damage to the processing surface because the plasma occurrence is isolated. 7. During the processing, there is no static electricity after processing. 8. There is no adverse effect on electronic electronic devices, etc. due to the special electrode structure. ■ Our unique features that other companies are not in other companies 1. Avoid damage to work molecules by suppressing ultraviolet light at the time of plasma production (conventional intensity ratio 1/80). 2. By optimizing the powered high -frequency power and the dielectric, the dust (0.3 μ or more) from the inside of the plasma electrode is almost zero and supports a clean process. It can be used almost semi -permanently without replacing the dielectric (electrode) used in discharge electrodes or polishing, contributing to the running cost. 3. The special electrode structure enables high -density radical generation, succeeded in consumption of nitrogen gas used for plasma occurrence, and contributes to running costs.

  • Product

    Attotive pressure plasma device downstream type (Precise series)




*Please note that we may not be able to accommodate sample requests.

1 Models of Attotive pressure plasma device downstream type (Precise series)

Product Image Part Number Price (excluding tax) Processable plasma processing width (length)
Attotive pressure plasma device downstream type (Precise series)-Part Number-Precise downstream type

Precise downstream type

Available upon quote 200mm ~ 2950mm

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About Company Handling This Product

E -Square Co., Ltd.

  • Japan
  • Since 1999

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