Semiconductor crystal sapphire wafer-window / substrate-AL2O3 (SAPPHIRE)
Semiconductor crystal sapphire wafer-window / substrate-Tours Co., Ltd.

Semiconductor crystal sapphire wafer-window / substrate
Tours Co., Ltd.


About This Product

■ Overview It is not a natural stone jewel, but a highly purity artificial crystal mainly used in the optical field. Colorless and transparent. Sapphires with poor purity are slightly colored. If there are many chromiums in the impurities, it turns blue, and if there are many iron and titanium, it becomes blue. ■ Use Optical window: It has 70 to 90%permeability in the wavelength band of 200 to 5,500 nm. We have a performance that is easy to handle in various fields such as heat resistance, thermal conductivity, chemical resistance, and insulation, and we also handle various processed products such as ultra -high vacuum windows that utilize strength (hardness). Masu. In the semiconductor field, there are GAN ON SAPPIHRE, ALN ON SAPPHIRE based on sapphire, etc., and we also use C side, A, R, M -side, etc. ■ Section of face The C side is the most popular axial direction as a GAN epitaxical growth substrate. We also provide a direction that minimizes multiple reflexions such as C -axis and R axis in the femtosecond laser window. C side = (0001) A side = (11-20) R side = (1-102) M side = (10-10) Random cut ・ Special direction It is mainly used to grow the GAN epitaxial layer on the nutrition/semi -polarth C -axis plane substrate to improve the light emission efficiency. In general, GAN Epitaxy grows along the C -axis of the polarity axis, which causes powerful electric fields in the active layer quantum well in the GAN -based device, reducing light emitting efficiency. By developing a non -polar side GAN epitaxial, you may be able to overcome this physical phenomenon and improve light emission efficiency.

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    Semiconductor crystal sapphire wafer-window / substrate




*Please note that we may not be able to accommodate sample requests.

1 Models of Semiconductor crystal sapphire wafer-window / substrate

Product Image Part Number Price (excluding tax) Appeared elastic limit Crossing rate Crystal lattice constant Crystal structure DN/DT DN/DU = 0 Expenditure rate Heat expansion coefficient Melting point Morse hardness Optical uniformity Permeation range Poisson ratio Reflection loss Refractive index Thermal conductivity Volume elasticity rate Young's modulus density specific heat
Semiconductor crystal sapphire wafer-window / substrate-Part Number-AL2O3 (SAPPHIRE)

AL2O3 (SAPPHIRE)

Available upon quote 275GPA 148.1GPa a = b = 4.758 å, c = 12.991å Hexagonal 13.7x10⁻⁶AT5.4um
1.5um
(DN/DT DN/DT = 0:00)
C axis parallel 11.5 (1MHz) C axis parallel 5.6x10⁻⁶K
C Axial vertical 5.0x10⁻⁶/K
2,040 ° C 9 ΔN <10⁻⁶/cm> 180 ~ 5,500Nm 0.25 11.7% of Jin light, abnormal light 14.2% (1.06UM double -sided) No1.75449, NE1.74663 (1.06um) 27.21W/ (MXK) AT300K (20 ℃) 240GPA 335GPA 20 ℃/9.71W M/K 419JKG⁻¹K⁻¹⁻¹

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About Company Handling This Product

Tours Co., Ltd.

  • Japan
  • Since 2016
  • 2 employees

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