Japan Create Co., Ltd.'s Company Profile and Products
Profile
| Country | Japan |
|---|---|
| Founded | 1963 |
| Number of Employees | 40 |
| Website | Japan Create Co., Ltd. Website |
Products Handled By Japan Create Co., Ltd.
17 registered products of Japan Create Co., Ltd.
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Japan Create Co., Ltd.
PET bottle Plasma CVD device Single Bottle DLC Silamon Memorial Manual Loding
It is a film forming device specialized in DLC coating that we are good at, applying plasma CVD processing technology and is co...
Japan Create Co., Ltd.
PET bottle Plasma CVD device linear type DLC Silamon Silam Memorial Loading Automatic Lording
It is a film forming device specialized in DLC coating that we are good at, applying plasma CVD processing technology and is co...
Japan Create Co., Ltd.
Pressure film forming sputtering device
■ Characteristics ・ Continuous film is possible from single crystal epitaxial buffer layer to piezoelectric membrane ・ Elemen...
Japan Create Co., Ltd.
Oxide membrane / nitride film plasma CVD device
■ Characteristics ・ Realizes low stress, high hardness, and high insulation by 2 frequency independent sealing method. ・ Real...
Japan Create Co., Ltd.
CO2 Rubber Jet nozzle Using CO2 spray cleaning device
■ Characteristics ・ Our unique nozzle: CO2 Rubber Jet nozzle is used Variable CO2 particle speed and particle density can be v...
Japan Create Co., Ltd.
Achieving excellent membrane thickening and reproducibility DLC coating device
■ Characteristics ・ The film source can be selected from the RF Plasma CVD method and the ionized vaporization method. ・ The ...
Japan Create Co., Ltd.
Epitaxial-Eb Vaporizer Fineness of excellent membrane thickening and reproducibility by substrate rotation
■ Characteristics ・ Ideal for single crystal film by epitaxial promotion mechanism ・ Oxidation promotion gas introduction mec...
Japan Create Co., Ltd.
2 frequency independent cleaning method assassing device
■ Overview This is a mass -produced device that can manually process up to 8 inch substrates in full automatic. It is a versati...
Japan Create Co., Ltd.
Bachelor Plasma Clearing System carbon nanotube synthetic device
■ Characteristics ・ CNT synthesis is possible automatically ・ Equipped with a board plasma cleaning system ・ Realizes excell...
Japan Create Co., Ltd.
Sputtering technology Applied screw stirring powder sputtering device
■ Overview This is a device that uses sputtering technology that we are good at, and forms a variety of three -dimensional meta...
Japan Create Co., Ltd.
2 frequency independent cleaning method dry etching device
■ Overview This is a mass production device that can manually process the maximum φ12 inch substrate fully. It is a versatile d...
Japan Create Co., Ltd.
Heating process -specific elemental omission reduction pressurized RTA device
■ Characteristics ・ Reduces the elemental omission peculiar to the heating process ・ Pressure process from decompression proc...
Japan Create Co., Ltd.
Achievement pressure 10PA vacuum heating and drying furnace
■ Characteristics ・ Used temperature range: Up to 450 ° C ・ Achievement pressure: 10PA ・ Automatic drying process recipe: 30...
Japan Create Co., Ltd.
Multi -unit sputtering device equipped with a unique spatta cats
■ Characteristics ・ Equipped with our own spatta cathode ・ Equipped with a 3 -axis mechanism (up and down, rotation, rotation...
Japan Create Co., Ltd.
Multi Chamber Specifications for OLED for OLED
■ Overview It is a multi -chamber specification device that is ideal for device development and material development. It is pos...
Japan Create Co., Ltd.
Equipped with unique spatta cats
■ Characteristics ・ Equipped with our own spatta cathode ・ Equipped with a 4 -axis mechanism (up and down, turned, rotation, ...
Japan Create Co., Ltd.
Unique plasma control method plasma CVD device
■ Characteristics ・ Chamber volume 1m3 ・ Unique plasma control method ・ Multi -stage multi -dose batch processing is possibl...
Products
6 Japan Create Co., Ltd.'s products are listed.