This is an inspection device that inspects the crystal orientation of single crystal wafers and ingots for different purposes. Therefore, it is equipped with two workbenches (wafer surface measurement, orientation flat surface measurement, notch orientation measurement/Ingot end surface).
Measurable sizes are Wafer: Dia 2-8 inches, Ingot: Dia 2-8 inches / Maximum length 300mm
■Measurement
After fixing the sample to the jig on the sample stage (manually) and pressing the measurement start button, the goniometer will scan, measure the X-ray diffraction line intensity, and display the angle of the strongest peak position. The time for one measurement is approximately 5 seconds. Angles are displayed in degrees, minutes, and seconds.
■Preparation before measurement
・Determination of the measurement lattice plane of the sample crystal and its diffraction X-ray angle (measurement angle θ)
・Setting correction based on standard sample
・Setting the assumed offset angle (setting the ω scanning angle range)
・Sample crystal positioning jig settings (set for each crystal size)
Equipment specifications
■X-ray generation part
・Tube voltage: 30KV (1 point preset type)
・Tube current: 1mA (1 point preset type)
・X-ray tube: Cu air-cooled with safety circuit
■X-ray optical system
・θ-2θ scanning goniometer
・X-ray focus - Slit sample - Detector 200 ~ 300mm
- Installation angle (θ/2θ) ≦90° semi-fixed Measurement scanning angle setting range -5° to 60°.
■X-ray detection/measurement section
・Detector
・Measurement operation: Measurement start/stop button
・Measurement result display: Peak position angle encoder digital display
■X-ray window shutter
Measurement Linked with start/stop button
■X-ray protection cover
X-ray window opening/closing fail-safe interlocking
■Installation equipment conditions
・Power supply: Single phase 220V±10% 300W 1 piece
・Grounding resistance 100Ω or less
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